This work demonstrates the efficiency of a Germanium and Carbon co-implantation that suppresses the Boron Transient Enhanced Diffusion, enhances Boron activation and enables large improvement of Short Channel Effects in PMOS devices while maintaining drive current performances. We present here 65/45nm node devices on conventional bulk substrates featuring Germanium and Carbon engineered shallow junctions that enable to reduce the Drain Induced Barrier Lowering compared to devices implanted only with Boron. This improvement is attributed to the suppression of Boron channelling with Ge pre-amorphization (PAI), and to the reduction of Boron TED due to the trapping of interstitial defects by Carbon with Germanium PAI.
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Dumont, B., Pouydebasque, A., Pawlak, B. et al. Germanium & Carbon Co-implantation for Enhanced Short Channel Effect Control in PMOS Devices. MRS Online Proceedings Library 912, 105 (2005). https://doi.org/10.1557/PROC-0912-C01-05