Hot-wire CVD a-Si:H TFT on Plastic Substrates


Fabrication of hot-wire chemical vapor deposition (HWCVD) of amorphous silicon (a-Si) thin film transistors (TFT) on thin polyimide sheets is reported. A single graphite filament at 1500 °C was used for HWCVD and device quality amorphous silicon films were deposited with no thermal damage to plastic substrate. Top-gate staggered thin film transistors (TFTs) were fabricated at 150°C using hot-wire deposited a-Si channel, plasma enhanced chemical vapor deposition (PECVD) silicon nitride gate dielectric, and microcrystalline n+ drain/source contacts. Low leakage current of 5×10-13 A, high switching current ratio of 1.3×107, and small sub threshold swing of 0.3 V/dec was obtained for TFTs with aspect ratio of 1300µm/100µm. The field effect mobility was extracted to be 0.34 cm2/V.s.

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  1. 1

    C. McArthur, M. Meitine, and A. Sazonov, “Optimization of 75°C Amorphous Silicon Nitride for TFTs on Plastics,” in Flexible Electronic — Materials and Device Technology, N. Fruehauf, B.R. Chalamala, B.E. Gnade, J. Jang, eds., Mat.Res.Soc.Symp.Proc, Pittsburgh, PA, vol.769, pp. 303308, (2003)

  2. 2

    B. Stannowski, R.E.I. Schropp, R.B. Wehrspohn, and M.J. Powell, “Amorphous silicon Thin Film Transistors deposited by VHG-PECVD and Hot-Wire CVD”, J. Non-Cryst. Solids 299302, (2002)

  3. 3

    A.A. Langford, M.L. Fleet, B.P. Nelson, W.A. Langford, and N. Maley, “Infrared Absorption Strength and Hydrogen Content of Hydrogenated Amorphous Silicon”, Phys Rev B Condense Matter., vol. 45, no. 23, pp. 1336713377, (1992)

    CAS  Article  Google Scholar 

  4. 4

    K.S. Karim, A.Nathan, M.Hack, W.I. Milne, “Drain-Bias dependence of threshold voltage stability of amorphous silicon TFTs”, IEEE Electron Device Lett., 25(4), pp188190, (2004)

    CAS  Article  Google Scholar 

  5. 5

    F. Taghibakhsh, K.S. Karim, A. Madan, “Low leakage a-Si:H Thin Film Transistors deposited on Glass Substrates using Hot Wire Chemical Vapor Deposition,” Journal of Vacuum Science and Technology, in press.

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Taghibakhsh, F., Karim, K.S. Hot-wire CVD a-Si:H TFT on Plastic Substrates. MRS Online Proceedings Library 910, 1802 (2005).

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