Nucleation and Growth of Quasicrystalline Silicon Thin Films on Glass Substrate Synthesized by Ceramics Hot Wire Chemical Vapor Deposition

Abstract

In this work, we report on nucleation and growth of polycrystalline silicon thin-film on glass substrate synthesized by ceramics hot wire chemical vapor deposition. We observed perfect geometrical patterns at the surface topography of these films, i.e. “five-fold” symmetry and “sixfold” symmetry. We found “confinement of heat and photon” is a new technique in developing silicon thin-film with novel structure, i.e. quasicrystalline silicon thin-film on glass substrate. The influence of photons emitted from the hot filament on fast nucleation of nanocrystal silicon on glass substrate has been discussed.

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Middya, A.R., Liang, JJ. & Ghosh, K. Nucleation and Growth of Quasicrystalline Silicon Thin Films on Glass Substrate Synthesized by Ceramics Hot Wire Chemical Vapor Deposition. MRS Online Proceedings Library 910, 809 (2005). https://doi.org/10.1557/PROC-0910-A08-09

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