Integration of Top-Down and Bottom-Up Nanofabrication Schemes

Abstract

The fabrication of 3D nanostructures, which have tunable, sub-100 nm dimensions in all three directions, is a key issue of nanotechnology. Here we describe the integration of top-down nanoimprint lithography (NIL) and bottom-up layer-by-layer (LBL) assembly for the preparation of 3D hybrid nanostructures. NIL provided down to sub-100 nm poly(methylmethacrylate) (PMMA) structures. These were employed to fabricate patterned self-assembled monolayers of cyclodextrin (CD) host molecules on silicon oxide . The consecutive LBL assembly with adamantyl guest-functionalized dendrimers and CD-modified gold nanoparticles resulted in patterned multilayer structures with thicknesses of 3-30 nm. The x,y control by NIL and the z control by LBL assembly ultimately allowed the fabrication of circular structures with a radius of 25 nm and a thickness of 20 nm. The integration of the two methods has thus yielded a versatile 3D nanofabrication methodology comprising of 10-40 process steps.

This is a preview of subscription content, access via your institution.

References

  1. [1]

    G. Decher, Science 1997, 277, 1232.

    CAS  Article  Google Scholar 

  2. [2]

    Liu, J.; Ong, W.; Román, E.; Lynn, M. J.; Kaifer, A. E. Langmuir 2000, 16, 3000; Liu, J.; Alvarez, J.; Kaifer, A. E. Adv. Mater. 2000, 12, 1381.

    CAS  Article  Google Scholar 

  3. [3]

    O. Crespo-Biel, A. Juković, M. Karlsson, D. N. Reinhoudt, J. Huskens, Isr. J. Chem. 2005, 45, 353.

    CAS  Article  Google Scholar 

  4. [4]

    Michels, J. J.; Baars, M. W. P. L.; Meijer, E. W.; Huskens, J.; Reinhoudt, D. N. J. Chem. Soc. Perkin Trans. 2 2000, 1914.

    Article  Google Scholar 

  5. [5]

    O. Crespo-Biel, B. Dordi, D. N. Reinhoudt, J. Huskens, J. Am. Chem. Soc. 2005, 127, 7594.

    CAS  Article  Google Scholar 

  6. [6]

    (a) J. Huskens, M. A. Deij, D. N. Reinhoudt, Angew. Chem. Int. Ed. 2002, 41, 4467; (b) T. Auletta, B. Dordi, A. Mulder, A. Sartori, S. Onclin, C. M. Bruinink, C. A. Nijhuis, H. Beijleveld, M. Péter, H. Schönherr, G. J. Vancso, A. Casnati, R. Ungaro, B. J. Ravoo, J. Huskens, D. N. Reinhoudt, Angew. Chem. Int. Ed. 2004, 43, 369; (c) S. Onclin, A. Mulder, J. Huskens, B. J. Ravoo, D. N. Reinhoudt, Langmuir 2004, 20, 5460.

    CAS  Article  Google Scholar 

  7. [7]

    P. Maury, M. Péter, V. Mahalingam, D. N. Reinhoudt, J. Huskens, Adv. Funct. Mater. 2005, 15, 451.

    CAS  Article  Google Scholar 

  8. [8]

    P. Maury, M. Escalante, D. N. Reinhoudt, J. Huskens, Adv. Mater. 2005, 17, 2718.

    CAS  Article  Google Scholar 

  9. [9]

    L. J. Guo, J. Phys. D, Appl. Phys. 2004, 37, R123.

    CAS  Article  Google Scholar 

Download references

Author information

Affiliations

Authors

Corresponding author

Correspondence to Jurriaan Huskens.

Rights and permissions

Reprints and Permissions

About this article

Cite this article

Maury, P., Crespo-Biel, O., Péter, M. et al. Integration of Top-Down and Bottom-Up Nanofabrication Schemes. MRS Online Proceedings Library 901, 201 (2005). https://doi.org/10.1557/PROC-0901-Rb12-01

Download citation