Electrochemical Dip-pen Nanolithography of Conductive Wires

Abstract

We have explored the fabrication of conductive nanowires on different types of substrates by electrochemistry-assisted DPN (E-DPN) with an atomic force microscope. Various parameters of E-DPN were examined systematically including the effects of coating methods and the types of the tips on the electrodeposition behavior. It was found that a chemically-modified Si AFM tip is very suitable for E-DPN. Platinum and polyaniline nanowires with a line width ofca.100 nm to sub- 100 nm were prepared on the metallic (Au) and semiconducting (Si) surfaces. The parameters indispensable for E-DPN of metal and polymer nanowires on an insulating SiO2 surface will also be discussed.

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Correspondence to Fapei Zhang.

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Zhang, F., Yamada, R. & Tada, H. Electrochemical Dip-pen Nanolithography of Conductive Wires. MRS Online Proceedings Library 901, 509 (2005). https://doi.org/10.1557/PROC-0901-Ra05-09-Rb05-09

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