Plasma-Assisted MOCVD Growth of ZnO Thin Films


ZnO thin films have been grown by metalorganic chemical vapor deposition (MOCVD) also plasma assisted (PA-MOCVD) on c-axis oriented sapphire (0001) and Si(001) substrates using the alternative Zn(TTA)2·tmed (HTTA=2-thenoyltrifluoroacetone,TMED=N,N,N’,N’-tetramethylethylendiamine) precursor. The structural, morphological and optical properties of ZnO films have been investigated. The results show that the O2 plasma assisted growth results in an improvement of the structure, in smoother morphologies and in a better optical quality with a sharp and intense exciton of ZnO films.

This is a preview of subscription content, access via your institution.


  1. 1.

    S.J. Pearton, D.P. Norton, K. Ip, Y.W. Heo, T. Steiner, Progress in Material Science, 50, 293 (2005) and reference therein.

    CAS  Article  Google Scholar 

  2. 2.

    J.J. Robbins, J. Harvey, J. Leaf, C. Fry, C.A. Wolden, Thin Solid Films, 473, 35 (2005).

    CAS  Article  Google Scholar 

  3. 3.

    CRC Handbook of Chemistry and Physics, 57th ed, CRC press, 1976–1977.

  4. 4.

    G. Malandrino, M. Blandino, L. M. S. Perdicaro, I. L. Fragalà, P. Rossi, P. Dapporto, Inorg. Chem., 44, xxx, (2005). DOI {do10.1021/ic051175i}.

    Article  Google Scholar 

  5. 5.

    D.A.G. Bruggemann, Ann. Phys.(Leipzig) 24, 636 (1965).

    Google Scholar 

  6. 6.

    S. Adachi in “Optical Constants of Crystalline and Amorphous Semiconductors”, Kluwer Academic Publishers, Boston, p. 420–424 (1999).

  7. 7.

    A. Matsuda, Thin Solid Films 337, 1 (1999).

    CAS  Article  Google Scholar 

Download references


This work has been partially supported by INSTM (Consorzio Interuniversitario Nazionale per la Scienza e Tecnologia dei Materiali) within the PRISMA project.

Author information



Corresponding author

Correspondence to Maria Losurdo.

Rights and permissions

Reprints and Permissions

About this article

Verify currency and authenticity via CrossMark

Cite this article

Losurdo, M., Giangregorio, M.M., Capezzuto, P. et al. Plasma-Assisted MOCVD Growth of ZnO Thin Films. MRS Online Proceedings Library 892, 906 (2005).

Download citation