Abstract
Titanium diboride has been claimed as a very promising candidate material for protective applications in the magnetic recording. Its oxidation resistance at room temperature is a critical criterion in assessing this application potential. In this paper, the oxidation characteristics of ultrathin TiB2 thin films, such as overcoat erosion and oxide thickness, are investigated via a combination of x-ray reflectivity, x-ray photoelectron spectroscopy (XPS), and atomic force microscopy. It was found that a <2-h exposure to air at room temperature led to the formation of approximately 15-Å-thick, well-defined oxides at the expense of an approximately 9-Å erosion of the TiB2 overcoats, coupled with the existence of a sharp oxide/TiB2 interface. XPS studies confirmed the existence of the oxides. Considering the decreasing allowable thickness for such protective overcoats, oxidation and the resultant thickness gain negate such a potential of ultrathin TiB2 films. The results in our current report provide a new perspective on its potential as protective overcoats in magnetic recording.
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References
Y-W. Chung and C.S. Bhatia, Data Storage 5, 47 (1998).
S. Anders, I. Brown, and D. Bogy, Data Storage 4, 31 (1997).
B. Bhushan and J. Ruan, Surf Coat. Technol. 68/69, 644 (1994).
E.C. Cutiongco, D. Li, Y-W. Chung, and C.S. Bhatia, ASME J. Tribol. 118, 543 (1996).
R.D. Ott, T.W. Scharf, D. Yang, and J.A. Barnard, IEEE Magn. 34, 1735 (1998).
X. Yun, R.C. Hsiao, and D.B. Bogy, IEEE Magn. 33, 938 (1997).
Y. Yahisa, Y. Shiroishi, S. Hishiyama, T. Ohno, and K. Takagi, IEEE Magn. 26, 2685 (1990).
S.K. Ganapathi, R.D. Balanson, and F.E. Talke, ASME J. Tribol. 114, 263 (1992).
M.U. Guruz, I. Widlow, V.P. Dravid, Y-W. Chung, M-L. Wu, M. Lacerda, C.S. Bhatia, Y-h. Yu, and S.C. Lee, inSurface Engineering: In Materials Science I, edited by S. Seal, N.B. Dahotre, J.J. Moore, and B. Mishra (The Mineral, Metals & Materials Society, Warrendale, PA, 2000), p. 173.
H.J. Goldschmidt,Interstitial Alloys (Plenum, New York, 1967).
H. Holleck, J. Vac. Sci. Technol., A 4, 2661 (1986).
F. Huang, J.A. Barnard, and M.L. Weaver, J. Mater. Res. 15, 945 (2001).
W.J. Liu, J.N. Zhou, A. Rar, and J.A. Barnard, Appl. Phys. Lett. 78, 1427 (2001).
A. Stierle, T. Mühge, and H. Zabel, J. Mater. Res. 9, 884 (1994).
A.J.G. Leenaers and D.K.G. de Boer, WinGIXA Manual (1998).
L.G. Parratt, Phys. Rev. 95, 359 (1954).
L. Névot and P. Croce, Rev. Phys. Appl. 15, 761 (1980).
G. Muralidharan, X.Z. Wu, H. You, A.P. Paulikas, and B.W. Veal, Scr. Mater, 37, 1177 (1997).
T.C. Huang, R. Gilles, and G. Will, Thin Solid Films 230, 99 (1993).
T.C. Huang, inAdvances in X-ray Analysis, edited by C.S. Barrett, J.V. Gilfrich, T.C. Huang, R. Jenkins, and P.K. Predecki (Plenum, New York and London, United Kingdom, 1990), Vol. 33, p. 91.
M.W. Chase Jr., C.A. Davies, J.R. Downey Jr., D.J. Frurip, R.A. McDonald, and A.N. Syverud,JANAF thermodynamical tables, 3rd ed. (American Chemical Society and American Institute of Physics, Washington, DC, 1986).
B. Lengeler, inAdvances in X-ray Analysis, edited by C.S. Barrett, J.V. Gilfrich, T.C. Huang, R. Jenkins, G.J. McCarthy, P.K. Predecki, R. Ryon, and D.K. Smith (Plenum, New York and London, United Kingdom, 1992), Vol. 35, p. 127.
K.L. Westra and D.J. Thomson, J. Vac. Sci. Technol., B 13, 344 (1995).
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Huang, F., Liu, W.J., Sullivan, J.F. et al. Room-temperature oxidation of ultrathin TiB2 films. Journal of Materials Research 17, 805–813 (2002). https://doi.org/10.1557/JMR.2002.0118
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DOI: https://doi.org/10.1557/JMR.2002.0118