Pulsed laser deposition of oriented V2O5 thin films

Journal of Materials Research volume 15, pages2249–2265(2000)Cite this article

Abstract

We have found that by varying only the substrate temperature and oxygen pressure five different crystallographic orientations of V2O5 thin films can be grown, ranging from amorphous to highly textured crystalline. Dense, phase-pure V2O5 thin films were grown on SnO2/glass substrates and amorphous quartz substrates by pulsed laser deposition over a wide range of temperatures and oxygen pressures. The films' microstructure, crystallinity, and texturing were characterized by electron microscopy, x-ray diffraction, and Raman spectroscopy. Temperature and oxygen pressure appeared to play more significant roles in the resulting crystallographic texture than did the choice of substrate. A growth map summarizes the results and delineates the temperature and O2 pressure window for growing dense, uniform, phase-pure V2O5 films.

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Affiliations

  1. National Renewable Energy Laboratory, 1617 Cole Blvd., Golden, Colorado, 80401, USA

    Jeanne M. McGraw, John D. Perkins, Falah Hasoon, Philip A. Parilla, Chollada Warmsingh & David S. Ginley

  2. Colorado School of Mines, 1500 Illinois St., Golden, Colorado, 80401, USA

    Eli Mateeva & Dennis W. Readey

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  1. Jeanne M. McGraw
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  2. John D. Perkins
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  3. Falah Hasoon
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  4. Philip A. Parilla
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  5. Chollada Warmsingh
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  6. David S. Ginley
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  7. Eli Mateeva
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Correspondence to Jeanne M. McGraw.

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McGraw, J.M., Perkins, J.D., Hasoon, F. et al. Pulsed laser deposition of oriented V2O5 thin films. Journal of Materials Research 15, 2249–2265 (2000). https://doi.org/10.1557/JMR.2000.0323

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