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Oxidation of nanocrystalline Mo–Si–N and nanolayered Mo–Si–N/SiC coatings

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Abstract

Oxidation of sputter-deposited nanocrystalline Mo–Si–N (MoSi2.2N2.5) coatings in oxygen–water vapor atmosphere has been studied in the temperature range 400–850 °C. In addition, the oxidation properties of nanolayered Mo–Si–N/SiC coatings at 700 °C were studied and compared to those of single-layer coatings of both components. No pest disintegration was observed in Mo–Si–N up to 200 h of oxidation. A preexponential rate constant of (3.7 ± 0.5) × 109 (1015 atoms/cm2)2/h and activation energy 1.03 ± 0.02 eV were determined from an Arrhenius plot for parabolic oxygen buildup on Mo–Si–N. Up to 20% less oxygen was detected in the oxidized nanolayered coatings compared to either of the components as a single layer, indicating an improvement in oxidation resistance.

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  1. Accelerator Laboratory, University of Helsinki, P.O. Box 9 (Siltavuorenpenger 20 M), FIN-00014, Finland

    P. Torri

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  1. P. Torri
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Torri, P. Oxidation of nanocrystalline Mo–Si–N and nanolayered Mo–Si–N/SiC coatings. Journal of Materials Research 14, 3552–3558 (1999). https://doi.org/10.1557/JMR.1999.0481

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  • DOI: https://doi.org/10.1557/JMR.1999.0481

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