Electrical and structural properties of SrTiO3 thin films deposited by plasma-enhanced metalorganic chemical vapor deposition

Abstract

The microstructure and electrical properties were investigated for SrTiO3(STO) thin films deposited on Pt/Ti/SiO2/Si substrates by PEMOCVD. The SrF2 phase existing in the STO films deposited at 450 °C influences the dielectric constant, dissipation factor, and leakage current density of STO films. The dielectric constant and dissipation factor of STO films deposited at 500 °C were 210 and 0.018 at 100 kHz, respectively. STO films were found to have paraelectric properties from the capacitance-voltage characteristics. Leakage current density of STO films at 500 °C was about 1.0 × 10−8 A/cm2 at an electric field of 70 kV/cm. The leakage current behaviors of STO films deposited at 500 and 550 °C were controlled by Schottky emission with applied electric field.

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References

  1. 1.

    H. Shinriki and M. Nakata, IEEE Trans. Electron Devices 38, 455 (1991).

    CAS  Article  Google Scholar 

  2. 2.

    S. Yamamichi, T. Sakuma, K. Takemura, and Y. Miyasaka, Jpn. J. Appl. Phys. 30, 2193 (1991).

    CAS  Article  Google Scholar 

  3. 3.

    L. A. Wills, W. A. Feil, B. W. Wessels, L. M. Tonge, and T. J. Marks, J. Cryst. Growth 107, 712 (1991).

    CAS  Article  Google Scholar 

  4. 4.

    W. A. Feil, B. W. Wessels, L. M. Tonge, and T. J. Marks, J. Appl. Phys. 67, 3858 (1990).

    CAS  Article  Google Scholar 

  5. 5.

    S. Liang, C. S. Chern, and Z. Q. Shi, Appl. Phys. Lett. 64, 3563 (1994).

    CAS  Article  Google Scholar 

  6. 6.

    L. A. Wills, B. W. Wessels, D. S. Richeson, and T. J. Marks, Appl. Phys. Lett. 60, 41 (1992).

    CAS  Article  Google Scholar 

  7. 7.

    J. R. Yeargan and H. L. Taylor, J. Appl. Phys. 39, 5600 (1968).

    CAS  Article  Google Scholar 

Download references

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Correspondence to Nam-Kyeong Kim.

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Kim, NK., Yoon, SG., Lee, WJ. et al. Electrical and structural properties of SrTiO3 thin films deposited by plasma-enhanced metalorganic chemical vapor deposition. Journal of Materials Research 12, 1160–1164 (1997). https://doi.org/10.1557/JMR.1997.0160

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