Indium-tin oxide thin films by metal-organic decomposition

Journal of Materials Research volume 8, pages3135–3144(1993)Cite this article

Abstract

In2O3–SnO2 films were produced by thermal decomposition of a deposit which was dip coated on borosilicate glass substrates from an acetylacetone solution of indium and tin acetoacetonate. Thermal analysis showed complete pyrolysis of the organics by 400 °C. The thermal decomposition reaction generated acetylacetone gas and was found to be first order with an activation energy of 13.6 Kcal/mole. Differences in thermal decomposition between the film and bulk materials were noted. As measured by differential scanning calorimetry using a 40 °C/min temperature ramp, the glass transition temperature of the deposited oxide film was found to be ∼462 °C, and the film crystallization temperature was found to be ∼518 °C. For film fabrication, thermal decomposition of the films was performed at 500 °C in air for 1 h followed by reduction for various times at 500 °C in a reducing atmosphere. Crystalline films resulted for these conditions. A resistivity of ∼1.01 × 10−3 Ω · cm, at 8 wt. % tin oxide with a transparency of ∼95% at 400 nm, has been achieved for a 273 nm thick film.

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Author notes

  1. Dennis Gallagher

    Present address: Phillips Laboratories, 345 Scarborough Road, Briarcliff Manor, New York, 10510, USA

  2. Francis Scanlan

    Present address: Anjou Recherche-CGE, B.P. 76, F-78600, Maisons-Lafitte, USA

  3. Terry A. Ring

    Present address: Department of Chemical and Fuels Engineering, University of Utah, Salt Lake City, Utah, 84112, USA

Affiliations

  1. Laboratoire de Technologie des Poudres, École Polytechnique Fédérale de Lausanne, CH-1015, Lausanne, Switzerland

    Dennis Gallagher, Francis Scanlan, Raymond Houriet, Hans Jörg Mathieu & Terry A. Ring

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  1. Dennis Gallagher
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  2. Francis Scanlan
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  3. Raymond Houriet
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  4. Hans Jörg Mathieu
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  5. Terry A. Ring
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Correspondence to Terry A. Ring.

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Gallagher, D., Scanlan, F., Houriet, R. et al. Indium-tin oxide thin films by metal-organic decomposition. Journal of Materials Research 8, 3135–3144 (1993). https://doi.org/10.1557/JMR.1993.3135

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