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Effects of CZSi furnace modification on density of grown-in defects

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Abstract

During large diameter Czochralski silicon growth, heat zone and argon flow influence the formation of defects in silicon crystal by changing the distribution of temperature. Different silicon crystals with various density of grown-in defects were grown by replacing the popular heater with the composite heater and changing the popular argon flow into a controlled flow. The experimental results have been explained well by the numeric simulation of argon flow.

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References

  1. Ryuta, J., Morita, E., Tanaka, T. et al., Crystal-originated singularities on Si wafer surface after SC1 cleaning, Jpn. J. Appl. Phys., 1990, 29: L1947-L1949.

    Article  Google Scholar 

  2. Umeno, S., Sadamitsu, S., Murakami, H. et a1., Axial micro-scopic distribution of grown-in defects in Czochralski-grown silicon crystals, Jpn. J. Appl. Phys., 1993, 32: L699-L702.

    Article  Google Scholar 

  3. Hourai, M., Sano, M., Surnita, S. et al., Progress in semiconductor fabrication, Proc. SEMICON. Tech. Conf., Geneva, March/April, 1993, Brussels: SEMI Eumpe, 1993, 367.

    Google Scholar 

  4. Nakamura, K., Saishoji, T., Kubota, T. et al., Formation process of gmw-in defects in czochralski grown silicon crystals, J. Crystal Growth, 1997, 180: 61–72.

    Article  Google Scholar 

  5. Ryuta, J., Morita, E., Tanaka, T. et al., Effect of crystal pulling rate on formation of crystal-originated particles on Si wafers, Jpn. J. Appl. Phys., 1992, 31: L293-L295.

    Article  Google Scholar 

  6. Umeno, S., Okut, M., Hourai, M. et el., Relationship between grown-in defects in czochralski silicon crystals, J. J. Appl. Phys., 1997, 36(5B) part 2: L591-L593.

    Google Scholar 

  7. Sinno, T., Brown, R. A., Von Ammon, W. et al., Point defect dynamics and oxidation-induced stacking-fault ring in CZ silicon crystals, J. Electmchem. Soc., 1998, 145: 302–318.

    Article  Google Scholar 

  8. Sinno, T., Brown, R. A., Modeling microdefect formation in CZ silicon, J. Electmchem. Soc., 1999, 146: 2300–2312.

    Article  Google Scholar 

  9. Mori, T., Brown, R. A., Kim, K. M., Comparison of simulation and experiments for heat transfer, oxygen segregation and microdefect formation in large scale CZ growth of silicon, Abs. # 496, ECS Meeting Ahstracts, May 3–8, 1998, San Diego, CA, Pennington: Electrochem. Soc., 1998, 496–499.

    Google Scholar 

  10. Takano, K., Kitagawa, K., Iino, E. et al., Defect in Semiconductors (eds. Suezawa, M., Katayama, H.), Japan: Yoshida, 1995.

    Google Scholar 

  11. Kinney, T. A., Bomside, D. E., Brown, R. A., Journal of Crystal Growth, 1993, 126: 413–434.

    Article  Google Scholar 

  12. Hourai, M. Nishikawa, H., Tanaka, T. et a1., Nature and generation of gmwn-in defects in CZ silicon crystals, in Semiconductor Silicon (eds. Huff, H., Goesele, U. Tsuya, H.), ECS Meeting, May 3–8, 1998, San Diego, CA, Pennington: Electrochem. Soc., 1998, 453–467.

    Google Scholar 

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Correspondence to Bingyan Ren.

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Ren, B., Zhang, Z., Liu, C. et al. Effects of CZSi furnace modification on density of grown-in defects. Sci. China Ser. A-Math. 45, 778–782 (2002). https://doi.org/10.1360/02ys9085

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  • DOI: https://doi.org/10.1360/02ys9085

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