Abstract
The parameters of plasma and the kinetics of generation and loss of active particles are investigated under conditions of a dc glow discharge in chlorine (P = 40–280 Pa, i p = 5–15 mA). It is found that the generation of atoms in chlorine plasma is supported by the dissociation of Cl2 molecules under electron impact, and the contribution by dissociative attachment does not exceed 10%. Calculation data are obtained on the mass composition of neutral and charged particles of plasma. It is demonstrated that the assumption of the first kinetic order of heterogeneous loss of atoms provides for adequate agreement of the experimentally obtained and calculated values of E/N, of the concentration of chlorine atoms, and of the density of positive ion flux to the surface of discharge tube.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Plazmennaya tekhnologiya v proizvodstve SBIS (Plasma Technology in the Production of VLSI), Einspruk, N. and Brown, D., Eds., Moscow: Mir, 1987 (Russ. transl.).
Danilin, B.S. and Kireev, V.Yu., Primenenie nizkotemperaturnoi plazmy dlya travleniya i ochistki materialov (Application of Low-Temperature Plasma in Etching and Cleaning of Materials), Moscow: Energoatomizdat, 1987.
Kupriyanovskaya, A.P. and Svettsov, V.I., Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol., 1987, vol. 30, no. 9, p. 71.
Efremov, A.M., Kim, D.P., and Kim, C.I., Thin Solid Films, 2003, vol. 435, p. 83.
Efremov, A.M. and Svetsov, V.I., Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol., 2004, vol. 47, no. 2, p. 104.
Gorokhov, A.V., Maksimov, A.I., Sizov, V.D., and Stepanova, A.A., Zh. Tekh. Fiz., 1972, vol. 42, no. 10, p. 2176.
Lee, Y.T., Lieberman, M.A., Lichtenberg, A.J. et al., J. Vac. Sci. Technol. A, 1997, vol. 15, p. 113.
Lee, C. and Lieberman, M.A., J. Vac. Sci. Technol. A, 1995, vol. 13, p. 368.
Svetsov, V.I., Kupriyanovskaya, A.P., and Maryshev, A.B., Zh. Prikl. Spektrosk., 1981, vol. 35, no. 2, p. 205.
Okabe, H., Photochemistry of Small Molecules, New York: Wiley, 1978. Translated under the title Fotokhimiya malykh molekul, Moscow: Mir, 1981.
Efremov, A.M., Kupriyanovskaya, A.P., and Svettsov, V.I., Zh. Prikl. Spektrosk., 1993, vol. 59, no. 3–4, p. 221.
Morgan, W.L., Plasma Chem. Plasma Process., 1992, vol. 12, p. 449.
Kupriyanovskaya, A.P., Rybkin, V.V., Sokolova, Yu.A., and Trostin, A.N., Kompilyatsiya dannykh po secheniyam elementarnykh protsessov dlya raschetov koeffitsientov skorostei protsessov v neravnovesnykh sistemakh (Compilation of Data on the Cross Sections of Elementary Processes for the Calculation of the Coefficients of Rates of Processes in Nonequilibrium Systems). Available from VINITI, Cherkassy, 1990, no. 921-V90.
Efremov, A.M., Svettsov, V.I., and Mikhalkin, V.P., Khim. Vys. Energ., 1995, vol. 29, p. 492.
Efremov, A.M. and Svettsov, V.I., Teplofiz. Vys. Temp., 2006, vol. 44, no. 2, p. 195 (High Temp. (Engl. transl.), vol. 44, no. 2, p. 189).
Donnelly, V.M., J. Vac. Sci. Technol. A, 1996, vol. 14, p. 1076.
Pyerminoff, S.D. and Buenker, R.J., J. Chem. Phys., 1981, vol. 57, p. 279.
Kravchenko, Yu.S., Osadchuk, V.S., and Slovetskii, D.I., Khim. Vys. Energ., 1989, vol. 27, p. 539.
Zimina, I.D., Maksimov, A.I., and Svettsov, V.I., Zh. Fiz. Khim., 1976, vol. 50, no. 5, p. 1209.
Brown, S.C., Basic Data of Plasma Physics, Cambridge, Mass.: MIT Press, 1959. Translated under the title Elementarnye protsessy v plazme gazovogo razryada, Moscow: Atomizdat, 1961.
Malyshev, M.V. and Donnelly, V.M., J. Appl. Phys., 2000, vol. 87, p. 1642.
Malyshev, M.V., Donnelly, V.M., Kornblit, A., and Ciampa, N.A., J. Appl. Phys., 1998, vol. 84, p. 137.
Efremov, A.M., Kim, D.P., and Kim, C.I., J. Vac. Sci. Technol. A, 2003, vol. 21, p. 1568.
Clyne, M.A. and Stedmane, D.H., Trans. Faraday Soc., 1998, vol. 64, no. 550, p. 2968.
Kupriyanovskaya, A.P., Svetsov, V.I., and Rybkin, V.V., Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol., 1986, vol. 33, no. 9, p. 31.
Sitanov, D.V., Svetsov, V.I., and Islyaikin, A.M., Izmerenie veroyatnosti gibeli atomov na stekle v plazme khlora (Measurement of the Probability of Loss of Atoms in Chlorine Plasma). Available from NIITEKIM, Cherkassy, 1994, no. 21-khp94.
Lieberman, M.A. and Lichtenberg, A.J., Principles of Plasma Discharges and Materials Processing, New York: Wiley, 1994.
Author information
Authors and Affiliations
Additional information
Original Russian Text © A.M. Efremov, V.I. Svettsov, D.V. Sitanov, 2008, published in Teplofizika Vysokikh Temperatur, Vol. 46, No. 1, 2008, pp. 15–22.
Rights and permissions
About this article
Cite this article
Efremov, A.M., Svettsov, V.I. & Sitanov, D.V. The parameters of plasma and the kinetics of generation and loss of active particles under conditions of discharge in chlorine. High Temp 46, 11–18 (2008). https://doi.org/10.1134/s10740-008-1003-4
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/s10740-008-1003-4