Studying Ni-B alloys with X-ray photoelectron spectroscopy

  • Yu. N. Bekish
  • T. V. Gaevskaya
  • L. S. Tsybulskaya
  • Goo-Yul Lee
  • Man Kim
Nanoscale and Nanostructured Materials and Coatings

Abstract

Ni and Ni-B films that contain 4–20 at % boron are produced by electroplating from baths containing sodium decahydroclovodecarborate and borane-morpholine as boron sources. The chemical state of Ni, B, and O atoms on the original film surface, as well as in that etched to 1 μm or annealed in air at 700°C was determined using X-ray photoelectron spectroscopy (XPS). Judging from the absolute values and directions of the peak shifts in XPS spectra of freshly obtained films, it is assumed that Ni and B atoms chemically interact with each other and Ni-Ni bonds are replaced by shorter Ni-B bonds. Boron is segregated in the surface layer of Ni-B films and hampers the thermal oxidation of nickel.

Keywords

Nickel Boron Boron Atom Boron Content Boron Oxide 

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Copyright information

© Pleiades Publishing, Ltd. 2010

Authors and Affiliations

  • Yu. N. Bekish
    • 1
  • T. V. Gaevskaya
    • 1
  • L. S. Tsybulskaya
    • 1
  • Goo-Yul Lee
    • 2
  • Man Kim
    • 2
  1. 1.Research Institute for Physical Chemical Problems of Belarussian State UniversityMinskBelarus
  2. 2.Korea Institute of Materials ScienceChangwon, Kyungsangnam-DoKorea

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