Advertisement

Polymer Science Series B

, Volume 52, Issue 1–2, pp 81–85 | Cite as

The mechanism of formation and some properties of thin fluorocarbon films deposited onto silicon plates by electron-beam polymerization of hexafluoropropylene from the vapor phase

  • M. A. Bruk
  • E. N. Zhikharev
  • I. A. Volegova
  • A. V. Spirin
  • N. V. Kozlova
  • E. N. Teleshov
  • V. A. Kal’nov
Synthesis
  • 26 Downloads

Abstract

The results of studying thin fluorocarbon films deposited onto single-crystal silicon plates through electron beam polymerization of hexafluoropropylene from the vapor phase are presented. The films are deposited under the action of an electron beam with an energy of 40 keV at a monomer vapor pressure of 5- 20 hPa. It is shown that plastic solid films consisting of a low-molecular-mass polymer with low thermal stability are formed at a beam current density on the order of 20 μA/cm2, while at current densities on the order of 150 μA/cm2, rigid brittle films of three-dimensional crossl inked polymer are formed with a thermal stability of about 350°C. It is assumed that the films are formed via chain polymerization, which at high current densities, is accompanied by polyrecombination processes leading to efficient chain crosslinking. It is found that polymer clusters are ordered in the course of film formation.

Keywords

Polymer Film Polymer Science Series High Current Density Silicon Plate Beam Current Density 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

Reference

  1. 1.
    M. A. Bruk, E. N. Zhikharev, A. V. Spirin, and V A. Kal’nov, Polymer Science, Ser. A 45, 32 (2003) [Vysokomol. Soedin., Ser. A 45, 45 (2003)].Google Scholar
  2. 2.
    M. A. Bruk, E. N. Zhikharev, A. V. Spirin, et al., RF Patent No. 2 190 628, Byull. Izobret., No. 28 (2002).Google Scholar
  3. 3.
    M. A. Bruk, E. N. Zhikharev, I. A. Volegova, et al., Polymer Science, Ser. B 50, 204 (2008) [Vysokomol. Soedin., Ser. B 50, 1566 (2008)].CrossRefGoogle Scholar
  4. 4.
    D. Shamiryan, T. Abell, F. Iacopi, and K. Maex, Mater. Today 7, 34 (2004).Google Scholar
  5. 5.
    Infrared Absorption Spectra of Polymers and Additives, Ed. by V. M. Chulanovskii (Khimiya, Moscow, 1969) [in Russian].Google Scholar
  6. 6.
    Fluoropolymers, Ed. by L. Wall (Wiley, New York, 1972; Mir, Moscow, 1975).Google Scholar
  7. 7.
    Kh. S. Bagdasar’yan, The Theory of Radical Polymerization (Khimiya, Moscow, 1966) [in Russian].Google Scholar
  8. 8.
    M. A. Bruk, A. V. Spirin, I. A. Volegova, et al., Proc. SPIE 6260, 62600J–1 (2006).CrossRefGoogle Scholar
  9. 9.
    A. I. Skobina and E. V. Volkova, in Radiation Chemistry of Polymers (Nauka, Moscow, 1966), p. 126.Google Scholar
  10. 10.
    R. E. Lowry, D. W. Brown, and L. A. Wall, J. Polym. Sci., Part A-l 4, 2229(1966).Google Scholar
  11. 11.
    S. R. Allayarov, I. P. Kim, I. M. Barkalov, and A. N. Il’in, Vysokomol. Soedin., Ser. A 32, 761 (1990).Google Scholar
  12. 12.
    D. Sianesi and G. Caporiccio, Makromol. Chem. 60, 213 (1963).CrossRefGoogle Scholar
  13. 13.
    M. A. Bruk and S. A. Pavlov, Polymerization on Solid Surfaces (Khimiya, Moscow, 1990) [in Russian].Google Scholar

Copyright information

© Pleiades Publishing, Ltd. 2010

Authors and Affiliations

  • M. A. Bruk
    • 1
  • E. N. Zhikharev
    • 2
  • I. A. Volegova
    • 1
  • A. V. Spirin
    • 1
  • N. V. Kozlova
    • 1
  • E. N. Teleshov
    • 1
  • V. A. Kal’nov
    • 2
  1. 1.Karpov Institute of Physical ChemistryMoscowRussia
  2. 2.Institute of Physics and TechnologyRussian Academy of SciencesMoscowRussia

Personalised recommendations