Glass Physics and Chemistry

, Volume 42, Issue 1, pp 116–117 | Cite as

X-ray phase analysis of copper oxides films obtained by DC reactive magnetron sputtering

  • A. E. Lapshin
  • V. V. Karzin
  • V. I. Shapovalov
  • P. B. Baikov


The phase composition of the copper oxides films obtained by DC reactive magnetron sputtering at oxygen partial pressures of 0.06, 0.10, and 0.16 mTorr is studied by X-ray phase analysis (XRPA) before and after their heat treatment within the range 300–550°C. It is found that the original phase compositions of the films of each lot are different; after the heat treatment at 550°C, all the films contained only CuO of a monoclinic structure.


films copper oxides reactive magnetron sputtering method X-ray phase analysis 


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Copyright information

© Pleiades Publishing, Ltd. 2016

Authors and Affiliations

  • A. E. Lapshin
    • 1
  • V. V. Karzin
    • 2
  • V. I. Shapovalov
    • 2
  • P. B. Baikov
    • 2
  1. 1.Institute of Silicate ChemistryRussian Academy of SciencesSt. PetersburgRussia
  2. 2.St. Petersburg Electrotechnical University LETISt. PetersburgRussia

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