X-ray phase analysis of copper oxides films obtained by DC reactive magnetron sputtering
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The phase composition of the copper oxides films obtained by DC reactive magnetron sputtering at oxygen partial pressures of 0.06, 0.10, and 0.16 mTorr is studied by X-ray phase analysis (XRPA) before and after their heat treatment within the range 300–550°C. It is found that the original phase compositions of the films of each lot are different; after the heat treatment at 550°C, all the films contained only CuO of a monoclinic structure.
Keywordsfilms copper oxides reactive magnetron sputtering method X-ray phase analysis
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