Abstract
The specific features of the formation of positional and combined disordering of the silicon-oxygen network structure during the synthesis of silica glasses are analyzed. It is demonstrated that this structural disordering affects the optical inhomogeneity in the refractive index in a block of the vapor-deposited silica glass. The experimental data obtained by ellipsometry, Auger electron spectroscopy, and spectrophotometry are used to reveal correlations between the physicochemical properties of the surface layer of the silica glass and the radiation losses in the UV spectral range.
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Original Russian Text © V.S. Zemlyanskii, A.A. Stepanchuk, M.M. Sychev, I.A. Khramtsovskii, 2008, published in Fizika i Khimiya Stekla.
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Zemlyanskii, V.S., Stepanchuk, A.A., Sychev, M.M. et al. Influence of the structure of the surface layer of silica glass on the radiation losses in the UV spectral range. Glass Phys Chem 34, 248–254 (2008). https://doi.org/10.1134/S1087659608030036
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DOI: https://doi.org/10.1134/S1087659608030036