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Growth of Thin Graphite Films on a Dielectric Substrate using Heteroepitaxial Synthesis

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Abstract

A technique for growing thin graphite films on a dielectric substrate by annealing the Al2O3(0001)/Ni(111)/ta-C structure has been optimized. This technique is based on catalytic decomposition of hydrocarbons on the surface of a single-crystal catalyst metal film on a dielectric substrate and subsequent diffusion and crystallization of carbon between the metal film and the substrate. A thin graphite film with a low density of crystal-structure defects is obtained on the dielectric substrate after chemical etching of the metal film.

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Funding

This study was performed within the framework of a state contract and supported in part by the Russian Foundation for Basic Research, projects nos. 18-38-00884 and 19-07-00432.

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Authors and Affiliations

  1. Kotelnikov Institute of Radioengineering and Electronics (Fryazino Branch), Russian Academy of Sciences, 141190, Fryazino, Moscow oblast, Russia

    I. A. Sorokin, D. V. Kolodko, V. A. Luzanov & E. G. Shustin

  2. National Research Nuclear University MEPhI (Moscow Engineering Physics Institute), 115409, Moscow, Russia

    I. A. Sorokin & D. V. Kolodko

Authors
  1. I. A. Sorokin
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  2. D. V. Kolodko
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  3. V. A. Luzanov
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  4. E. G. Shustin
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Corresponding author

Correspondence to I. A. Sorokin.

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The authors declare that they have no conflict of interest.

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Translated by A. Sin’kov

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Sorokin, I.A., Kolodko, D.V., Luzanov, V.A. et al. Growth of Thin Graphite Films on a Dielectric Substrate using Heteroepitaxial Synthesis. Tech. Phys. Lett. 46, 497–500 (2020). https://doi.org/10.1134/S1063785020050260

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  • DOI: https://doi.org/10.1134/S1063785020050260

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