Abstract
The chemical and the phase compositions of multilayer nanoperiodic SiO x /ZrO2 structures prepared by vacuum evaporation from separated sources and subjected to high-temperature annealing have been studied by X-ray photoelectron spectroscopy with a layer-by-layer etching. It is found that, under deposition conditions used, the silicon suboxide layers had the stoichiometric coefficient x ~1.8 and the zirconium-containing layers were the stoichiometric zirconium dioxide. It was found, using X-ray photoelectron spectroscopy, that annealing of the multilayer structures at 1000°C leads to mutual diffusion of the components and chemical interaction between ZrO2 and SiO x with predominant formation of zirconium silicate at heteroboundaries of the structures. The SiO x layers of the annealed nanostructures contained ~5 at % elemental silicon as a result of the phase separation and the formation of fine silicon nanocrystals.
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Original Russian Text © A.V. Boryakov, S.I. Surodin, D.E. Nikolichev, A.V. Ershov, 2017, published in Fizika Tverdogo Tela, 2017, Vol. 59, No. 6, pp. 1183–1191.
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Boryakov, A.V., Surodin, S.I., Nikolichev, D.E. et al. Chemical and phase compositions of multilayer nanoperiodic a-SiO x /ZrO2 structures subjected to high-temperature annealing. Phys. Solid State 59, 1206–1214 (2017). https://doi.org/10.1134/S1063783417060063
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DOI: https://doi.org/10.1134/S1063783417060063