Abstract
The current–voltage characteristics of n+-GaAs/n0-GaAs/N0-AlGaAs/N+-AlGaAs/n+-GaAs isotype heterostructures and n+-GaAs/n0-GaAs/n+-GaAs homostructures are studied. It is shown that, for a heterostructure under reverse bias providing the injection of electrons from n0-GaAs into N0-AlGaAs, the maximum operating voltage reaches a value of 48 V at a thickness of the N0-AlGaAs layer of 1.0 μm, and the current–voltage characteristic has no region of negative differential resistance. The operation of a homostructure is accompanied by a transition to the negative-differential-resistance region at a voltage of 10 V. Theoretical analysis in terms of the energy-balance model demonstrated that the reverse-biased isotype heterostructure has no negative-differential-resistance region because, in this case, the field domain does not collapse in contrast to what occurs in homostructures.
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The study was supported by a program of the Russian Foundation for Basic Research, grant no. 18-08-01130 A.
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Translated by M. Tagirdzhanov
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Slipchenko, S.O., Podoskin, A.A., Soboleva, O.S. et al. Specific Features of Carrier Transport in n+–n0–n+ Structures with a GaAs/AlGaAs Heterojunction at Ultrahigh Current Densities. Semiconductors 53, 806–813 (2019). https://doi.org/10.1134/S1063782619060241
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DOI: https://doi.org/10.1134/S1063782619060241