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Semiconductors

, Volume 52, Issue 5, pp 678–682 | Cite as

Air-Oxidation of Nb Nano-Films

  • A. V. Lubenchenko
  • A. A. Batrakov
  • D. A. Ivanov
  • O. I. Lubenchenko
  • I. A. Lashkov
  • A. B. Pavolotsky
  • B. Schleicher
  • N. Albert
  • K. Nielsch
XXV International Symposium “Nanostructures: Physics and Technology”, Saint Petersburg, Russia, June 26–30, 2017. Nanostructure Technology
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Abstract

X-ray photoelectron spectroscopy (XPS) depth chemical and phase profiling of air-oxidized niobium nanofilms has been performed. It is found that oxide layer thicknesses depend on the initial thickness of the niobium nanofilm. The increase in thickness of the initial Nb nano-layer is due to increase in thickness of an oxidized layer.

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Copyright information

© Pleiades Publishing, Ltd. 2018

Authors and Affiliations

  • A. V. Lubenchenko
    • 1
  • A. A. Batrakov
    • 1
  • D. A. Ivanov
    • 1
  • O. I. Lubenchenko
    • 1
  • I. A. Lashkov
    • 1
  • A. B. Pavolotsky
    • 2
  • B. Schleicher
    • 3
  • N. Albert
    • 3
  • K. Nielsch
    • 3
  1. 1.National Research University MPEIMoscowRussia
  2. 2.Chalmers University of TechnologyGoteborgSweden
  3. 3.IFW Dresden, Institute for Metallic MaterialsDresdenGermany

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