Russian Microelectronics

, Volume 46, Issue 6, pp 424–432 | Cite as

Development of the Technology of Magnetron Sputtering Deposition of LiPON Films and Investigation of Their Characteristics

  • S. V. Vasilev
  • M. E. Lebedev
  • L. A. Mazaletskii
  • A. V. Metlitskaya
  • A. A. Mironenko
  • V. V. Naumov
  • A. V. Novozhilova
  • A. S. Rudyi
  • I. S. Fedorov
Article
  • 1 Downloads

Abstract

The results of developing the technology of magnetron sputtering deposition of a LiPON solid electrolyte and an experimental investigation of its characteristics are presented. The basic processing operations and parameters providing the formation of films of the proper morphology, structure, and elemental and phase composition are described. The data of the measurement of the physical parameters of the films by cyclic voltammetry and potentiometry are represented.

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Copyright information

© Pleiades Publishing, Ltd. 2017

Authors and Affiliations

  • S. V. Vasilev
    • 1
    • 2
  • M. E. Lebedev
    • 1
  • L. A. Mazaletskii
    • 1
    • 2
  • A. V. Metlitskaya
    • 1
    • 2
  • A. A. Mironenko
    • 1
  • V. V. Naumov
    • 1
  • A. V. Novozhilova
    • 1
    • 2
  • A. S. Rudyi
    • 1
    • 2
  • I. S. Fedorov
    • 1
  1. 1.Institute of Physics and Technology, Yaroslavl BranchRussian Academy of SciencesYaroslavlRussia
  2. 2.Demidov Yaroslavl State UniversityYaroslavlRussia

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