Reactive Magnetron Sputter Deposition of Titanium Oxynitride TiNxOy Coatings: Influence of Substrate Bias Voltage on the Structure, Composition, and Properties
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TiOxNy films were grown onto 316L stainless steel substrate using radiofrequency (rf) magnetron sputtering from a pure titanium nitride target in Ar–O2 gas mixture with various substrate bias voltages. The aim of this work is to investigate the effect of applied substrate bias Vs, varied from 0 to –100 V, on the deposition rate, structure, hardness and optical properties of the TiNxOy films. The characterization of the coatings by grazing incidence X-ray diffraction exhibited a crystalline structure of a mixture of TiN, rutile and anatase. The indirect and direct bad gap were found to decrease for unbiased substrate voltage to Vs = −100 V from 3.84 to 3.20 eV. In addition, the coatings exhibit high transparency (transmittance over 80%). The hardness of the coatings were found in the range of 6.2 to 12.5GPa.
Keywords:magnetron sputtering TiNxOy 316L bias voltage
This research was financially supported by grant of the National Funding of Research (FNR) (Ministére de l’Enseignement Supérieur de la Recherche Scientifique, Algérie).
CONFLICT OF INTEREST
The authors declare that they have no conflict of interest.
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