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Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma

Abstract

In an inductively coupled high-frequency discharge plasma, SiCxNy:H films are obtained from a mixture of hexamethylcyclotrisilazane vapor and argon at substrate temperatures of 100 to 400°C and a discharge power of 200 W. The simplest plasma components (nitrogen, cyan, silicon atoms, CH free radicals, and C2 dimers) are determined. Some physicochemical properties of the films, including the growth rate, types of chemical bonds, refractive index, transparency interval, and contact angle, are studied. The synthesized films have a polymer-like structure.

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ACKNOWLEDGMENTS

We thank Yu.M. Rumyantsev for discussing the results of the work and I.V. Yushina for obtaining the sample transmission spectra.

Funding

This work was carried out within the state assignment of the Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences.

Author information

Correspondence to V. R. Shayapov.

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The authors declare that they have no conflict of interest.

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Translated by L. Mosina

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Shayapov, V.R., Chagin, M.N., Kolodin, A.N. et al. Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma. Glass Phys Chem 45, 525–531 (2019). https://doi.org/10.1134/S108765961906018X

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Keywords:

  • PECVD
  • silicon carbonitride
  • hexamethylcyclotrisilazane
  • emission spectroscopy