Technical Physics Letters

, Volume 45, Issue 5, pp 478–480 | Cite as

The Influence of High-Frequency Discharge on Substrate Temperature during Film Deposition

  • V. B. ShirokovEmail author
  • S. P. Zinchenko


The process of discharge-induced substrate heating at the initial stage of film synthesis by method of high-frequency cathode sputter deposition has been studied. The temperature to which the substrate was heated after the discharge switch-on was determined using the optical interferometry technique. In a working regime of barium strontium titanate film deposition onto a magnesium oxide substrate, the substrate temperature exceeded 1000°C.



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Copyright information

© Pleiades Publishing, Ltd. 2019

Authors and Affiliations

  1. 1.Southern Research Center, Russian Academy of SciencesRostov-on-DonRussia
  2. 2.Southern Federal UniversityRostov-on-DonRussia

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