Skip to main content
SpringerLink
Log in

TiN thin films deposited by filtered arc-evaporation: structure, properties and applications

  • Published:
Journal of Materials Science Aims and scope Submit manuscript

Abstract

A brief description of a plasma-optic system intended for filtered arc-deposition and the influence of its operational parameters on the deposition rate of TiN thin films are presented. A comparison of the microstructure, hardness, toughness, crystal lattice parameter, residual stresses, adhesion, performance and some other properties of TiN coatings deposited using either filtered arc-evaporation or conventional steered arc-evaporation techniques are given. The TiN coatings obtained by filtered arc-deposition are found to have a nanometre-grained structure, be highly uniform, smooth and droplet-phase-free. This leads to obtaining higher values of their hardness, toughness and adhesion compared with conventionally deposited TiN coatings, which results in improved performance of these coatings in wear and sliding applications.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. A. MATTHEWS and A. R. LEFKOW, Thin Solid Films 126 (1985) 283.

    Article  CAS  Google Scholar 

  2. J. E. DAALDER, J. Phys. D 9 (1976) 2379.

    Article  CAS  Google Scholar 

  3. Idem, Physica C 104 (1981) 91.

    Article  CAS  Google Scholar 

  4. H.-D. STEFFENS, M. MACK, K. MOEHWALD and K. REICHEL, Surf. Coating Technol. 46 (1991) 65.

    Article  CAS  Google Scholar 

  5. H. RHANDHAWA and P. C. JOHNSON, ibid. 31 (1987) 303.

    Article  Google Scholar 

  6. E. ERTUERK, H.-J. HEUVEL and H.-G. DEDERICHS, ibid. 39/40 (1989) 455.

  7. V. M. LUNEV, V. D. OVCHARENKO and V. M. KHOROSHIKH, Sov. Phys-Tech. Phys. 22 (1977) 55.

    Google Scholar 

  8. I. KONYASHIN, E. LEONOV, A. ANIKEEV and A. ZARAHKANI, Sov. Powder Met. Metals Ceramics 28 (1990) 816.

    Article  Google Scholar 

  9. I. KONYASHIN, A. ZARAHKANI and E. LEONOV, Sov. J. Non-Ferrous Met. 5 (1988) 76.

    Google Scholar 

  10. I. KONYASHIN, Surf. Coating Technol. 71 (1995) 277.

    Article  CAS  Google Scholar 

  11. A. ERDEMIR and C. CHENG, J. Vac. Sci. Technol. A 7 (1989) 2486.

    Article  CAS  Google Scholar 

  12. J.-E. SUNDREN, Thin Solid Films 128 (1985) 21.

    Article  Google Scholar 

  13. I. AKSENOV, V. BELOUS, V. PADALAKA and V. KHROSHIKH, Sov. J. Plasma Phys. 4 (1979) 425.

    Google Scholar 

  14. A. DORODNOV, S. MUBOYDZHAN, Y. PAMELOV and A. STRUKOV, J. Appl. Mech. Tech. Phys 22 (1981) 28.

    Article  Google Scholar 

  15. I. DEMIDENKO, N. LOMINO and V. PADALKA, Sov. Phys. Tech. Phys 21 (1976) 284.

    Google Scholar 

  16. D. SANDERS and E. PYLE, J. Vac. Sci. Technol. A 5 (1987) 2728.

    Article  CAS  Google Scholar 

  17. D. SANDERS, ibid. 7 (1989) 2339.

    Article  CAS  Google Scholar 

  18. V. CHERNYAEV and V. KARZE, Radio Electron. Commun. Syst. 25 (1982) 68.

    Google Scholar 

  19. I. AKSENOV, V. BELOUS, V. PADALKA and V. KHOROSHIKH, Instrum. Exp. Tech. (USSR) 21 (1978) 2.

    Google Scholar 

  20. I. AKSENOV, A. BELOKHVOSTIKOV, V. PADALKA, N. REPALOV and V. KHOROSHIKH, Plasma. Phys. Contr. Fussion 28 (1986) 761.

    Article  CAS  Google Scholar 

  21. A. DORODNOV and S. MIROSHKIN, High Temp. (USSR) 18 (1980) 821.

    Google Scholar 

  22. I. AKSENOV, V. BREN, V. PADALKA and V. KHOROSHIKH, Sov. Phys. Tech. Phys. 7 (1981) 497.

    Google Scholar 

  23. K. AKARI, H. TAMAGAKI, T. KUMAKIRI, K. TSUJI, E. KON and C. TAI, Surf. Coating Technol. 43/44 (1990) 312.

    Article  Google Scholar 

  24. C. TAI, E. KON and K. AKARI, Surf. Coating Technol. 43/44 (1990) 324.

    Article  Google Scholar 

  25. P. MARTIN, R. NETTERFIELD, A. BENDAVID and T. KINDER, in Annual Technical Conference Proceedings of the Society for Vacuum Coaters (Society of Vacuum Coates, Boston, 1993) p. 375.

    Google Scholar 

  26. P. MARTIN, R. NETTERFIELD and T. KINDER, Int. Appl. 16 (1992) 959.

    Google Scholar 

  27. P. MARTIN, R. NETTERFIELD, A. BENDAVID and T. KINDER, Surf. Coating Technol. 136 (1992) 54.

    Google Scholar 

  28. G. BARINOV, A. DODONOV and V. OGAY, “Ion-plating technology”, (Machinostroenie, Moscow, 1987) p. 34.

    Google Scholar 

  29. I. AKSENOV, Y. ANTUFEV and V. BREN, Phys. Chem. Mater. Treatment 4 (1981) 43.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Hard and Refractory Metals Research Institute, Warshavskoye Highway 56, Moscow, 113638, Russia

    I Konyashin

  2. RIMET Co., P.O. Box 167, Moscow, 125239, Russia

    G Fox-Rabinovich

  3. VIT Ltd, Uritskogo 40-58, Istra, Moscow, Reg., 125675, Russia

    A Dodonov

Authors
  1. I Konyashin
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. G Fox-Rabinovich
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. A Dodonov
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Konyashin, I., Fox-Rabinovich, G. & Dodonov, A. TiN thin films deposited by filtered arc-evaporation: structure, properties and applications. Journal of Materials Science 32, 6029–6038 (1997). https://doi.org/10.1023/A:1018679414707

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1023/A:1018679414707

Keywords

Search

Navigation