Abstract
Purpose: The main goal in the present study was to comparefollicular development and estradiol levels after ovarianstimulation in pituitary suppressed normally ovulatingwomen undergoing IVF, using highly purified urinary folliclestimulating hormone (FSH) (u-FSH-HP) and recombinantFSH (rec-FSH). A secondary variable in our study wasembryo implantation potential, which is closely related toappropriate follicular development and oocyte competence.
Methods: For the main purpose of this study, 30 IVF patients(group 1) were treated during IVF consecutive cycles, usingthe same stimulation protocol, with u-FSH-HP in the firsttreatment study cycle and rec-FSH in the second one. As acontrol group (group 2) for implantation rates obtained incycles treated with rec-FSH, 30 additional IVF patients wereincluded who underwent a second IVF attempt again with u-FSH-HP.
Results: The total dose of FSH used and ovarian responseobtained in terms of estradiol plasma levels and the totalnumber of growing follicles on the day of human chronicgonadotropin (HCG) injection were similar in both treatmentcycles in group 1 but better follicular dynamics and oocytematurity were obtained with rec-FSH. The implantation ratewas significantly higher in rec-FSH treated cycles in patientsin group 1 than in control women (group 2).
Conclusions: rec-FSH is more efficacious than u-FSH-HPwhen used in the same patient in inducing multiple folliculardevelopment in down-regulated cycles as indicated byovarian performance and oocyte maturity. In addition, rec-FSHyields significantly higher implantation rates thanu-FSH-HP when used in patients undergoing their second IVFattempt.
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Balasch, J., Fábregues, F., Creus, M. et al. Follicular Development and Hormonal Levels Following Highly Purified or Recombinant Follicle-Stimulating Hormone Administration in Ovulatory Women Undergoing Ovarian Stimulation After Pituitary Suppression for In Vitro Fertilization: Implications for Implantation Potential. J Assist Reprod Genet 17, 20–27 (2000). https://doi.org/10.1023/A:1009493829086
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DOI: https://doi.org/10.1023/A:1009493829086