Advertisement

Journal of Materials Science

, Volume 32, Issue 24, pp 6595–6600 | Cite as

Thermal and photo-induced surface damage in paratellurite

  • K. Yasutake
  • H. Kakiuchi
  • A. Takeuchi
  • K. Yoshii
  • H. Yamada
  • H. Kawabe
Article

Abstract

Long-term operation of TeO2 acousto-optical device is limited by the formation of surface damage caused by the He–Cd laser irradiation. Similar surface damage occurs during the heat treatment of the TeO2 crystal at 350°C. In this study, TeO2 specimens after various surface treatments have been observed by electron microscopy and X-ray photoelectron spectroscopy. The variation of the transmittance for mechanically polished specimens has been measured in situ during heat treatments. It was found that the thermal surface damage at 350°C was formed in the surface layer damaged by mechanical polishing. The mechanically damaged layer was amorphous and deficient in oxygen in the as-polished state. The electron microscopic observation revealed that the surface damage layer induced by heat treatments or by the ultraviolet light irradiation contained tellurium particles (20–40 nm) in diameter dispersed in the TeO2 matrix. On annealing the TeO2 specimen at 500°C in air, however, the particles disappeared because of the melting, evaporation and oxidation of tellurium which restores the transmittance of the crystal. Based on the results, combined with the observation of surface damage induced by the visible light irradiation, a possible mechanism of the surface damage formation has been briefly discussed.

Keywords

Tellurium Visible Light Irradiation Surface Damage Mechanical Polishing Surface Damage Layer 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    N. UCHIDA and Y. OCHMACHI, J. Appl. Phys. 40 (1969) 4692.CrossRefGoogle Scholar
  2. 2.
    Y. OHMACHI and N. UCHIDA, Rev. Electr. Commun. Lab. 20 (1972) 529.Google Scholar
  3. 3.
    H. INOUE, K. MIKI, K. YASUTAKE, K. YOSHII and H. KAWABE, in “Proceedings of the 1990 Spring Meeting of the Japan Society for Precision Engineering”, Tokyo, April 1990, p. 763 (in Japanese).Google Scholar
  4. 4.
    K. YASUTAKE, K. SUGIURA, H. INOUE, A. TAKEUCHI, M. UEMURA, K. YOSHII and H. KAWABE, Phys. Status. Solidi. (a) 125 (1991) 489.CrossRefGoogle Scholar
  5. 5.
    W. A. DUTTON and W. C. COOPER, Chem. Rev. 66 (1966) 657.CrossRefGoogle Scholar
  6. 6.
    P. K. RAYCHAUDHURI and S. REZNIK, J. Vac. Technol. A6 (1988) 1859.CrossRefGoogle Scholar
  7. 7.
    M. BORN and E. WOLF, “Principles of Optics” (Pergamon Press, New York, 1980).Google Scholar
  8. 8.
    R. STICKLER and G. R. BOOKER, Philos. Mag. 8 (1963) 859.CrossRefGoogle Scholar
  9. 9.
    K. OISHI, K. OKAMOTO and J. SUNADA, Thin Solid Films 148 (1987) 29.CrossRefGoogle Scholar
  10. 10.
    E. M. YOUNG and W. A. TILLER, J. Appl. Phys. 62 (1987) 2086.CrossRefGoogle Scholar

Copyright information

© Chapman and Hall 1997

Authors and Affiliations

  • K. Yasutake
    • 1
  • H. Kakiuchi
  • A. Takeuchi
  • K. Yoshii
  • H. Yamada
  • H. Kawabe
  1. 1.Department of Precision Science and Technology, Faculty of EngineeringOsaka UniversitySuita OsakaJapan

Personalised recommendations