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CVD Diamond

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Abstract

Diamond has the most extreme properties in mechanical, chemical and physical domain. There are many methods to manufacture synthetic diamond. Diamond layers can be deposited on various materials by many processes. The most robust and preferred method is chemical vapour deposition. A variety of researches have been performed on CVD coatings, and a range of developments has come forth starting from initial publications to the latest results. The process parameters of different CVD techniques have been discussed with technical limitations. Flow rate, applied power, increased pressure and temperature range are important parameters for the deposition of CVD diamond.

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Authors and Affiliations

  1. Department of Mechanical Engineering, National Institute of Technology, Srinagar, Srinagar, 190006, India

    Sajad Hussain Din, N. A. Sheikh & M. Mursaleen Butt

  2. P.G Department of Physics, Special Center for Nanosciences, National Institute of Technology, Srinagar, Srinagar, J&K, India

    M. A. Shah

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  1. Sajad Hussain Din
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Din, S.H., Shah, M.A., Sheikh, N.A. et al. CVD Diamond. Trans Indian Inst Met 72, 1–9 (2019). https://doi.org/10.1007/s12666-018-1454-1

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