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Electrochemical Studies and XPS Analysis of the Surface of Zirconium-702 in Concentrated Nitric Acid With and Without Fluoride Ions

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Abstract

Zirconium exhibited pseudo-passive behavior in fluorinated nitric acid (11.5 M HNO3 + 0.05 M NaF) as the current density measured from the electrochemical studies was several orders higher than the value in fluoride free nitric acid. Impedance studies on zirconium sample exposed in 11.5 M HNO3 for 240 h confirmed the formation of the passive film with high polarization resistance value and the calculated thickness of the film based on the capacitance value was about ~4.5 nm. On the other hand, in fluorinated nitric acid, the charge transfer resistance value associated with the zirconium dissolution process was dominant when compared to that of the film formation. Results of X-ray photoelectron spectroscopic investigations upheld the presence of ZrOF2 and ZrF4 and indicated that the protective oxide layer growth was restricted by the presence of fluoride ions.

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Authors and Affiliations

  1. Corrosion Science and Technology Division, Metallurgy and Materials Group, Indira Gandhi Centre for Atomic Research (IGCAR), Kalpakkam, 603102, India

    J. Jayaraj, D. Nanda Gopala Krishna & C. Mallika

  2. Materials Chemistry & Metal Fuel Cycle Group, IGCAR, Kalpakkam, India

    U. Kamachi Mudali

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  1. J. Jayaraj
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  2. D. Nanda Gopala Krishna
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  3. C. Mallika
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  4. U. Kamachi Mudali
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Jayaraj, J., Nanda Gopala Krishna, D., Mallika, C. et al. Electrochemical Studies and XPS Analysis of the Surface of Zirconium-702 in Concentrated Nitric Acid With and Without Fluoride Ions. Trans Indian Inst Met 71, 521–531 (2018). https://doi.org/10.1007/s12666-017-1165-z

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