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Structural, surface morphological and optical properties of nanocrystalline Cu2O films prepared by RF magnetron sputtering: substrate bias effect

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Abstract

Cuprous oxide films have been prepared on glass substrates by sputtering of metallic copper target in an oxygen partial pressure of 2 × 10−2 Pa under different substrate bias voltages in the 0 to −100 V range employing RF magnetron sputtering technique. The influence of substrate bias voltage on the structural, surface morphological, electrical and optical properties has been studied systematically. The crystallite size of the films increases with the increase of substrate bias voltage up to −60 V. The films formed at substrate bias voltage of −60 V show low electrical resistivity of 12 Ω cm, larger crystallite size of 35 nm and optical band gap of 2.40 eV.

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Hari Prasad Reddy, M., Sreedhar, A. & Uthanna, S. Structural, surface morphological and optical properties of nanocrystalline Cu2O films prepared by RF magnetron sputtering: substrate bias effect. Indian J Phys 86, 291–295 (2012). https://doi.org/10.1007/s12648-012-0057-7

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