Abstract
Cuprous oxide films have been prepared on glass substrates by sputtering of metallic copper target in an oxygen partial pressure of 2 × 10−2 Pa under different substrate bias voltages in the 0 to −100 V range employing RF magnetron sputtering technique. The influence of substrate bias voltage on the structural, surface morphological, electrical and optical properties has been studied systematically. The crystallite size of the films increases with the increase of substrate bias voltage up to −60 V. The films formed at substrate bias voltage of −60 V show low electrical resistivity of 12 Ω cm, larger crystallite size of 35 nm and optical band gap of 2.40 eV.
Similar content being viewed by others
References
K Akimoto, S Ishizuka, M Yanagita, Y Nawa, G K Paul and T Sakurai Solar Energy 80 715 (2006)
E A Souza, R Landers, L P Cardoso, T G S Cruz, M H Tabacniks and A Gorenstein J. Power Sources 155 358 (2006)
H Zhu, J Zhang, C Li, F Pan, T Wang and B Huang Thin Solid Films 517 5700 (2009)
N Ozer and F Tepehan Solar Energy Mater. Solar Cells 30 13 (1993)
R Dong, D S Lee, W F Xiang, S J Oh, D J Seoung, S H Heo, H J Choi, M J K Won, S N Seo, M B Pyum, M Hasan and H S Hwang Appl. Phys. Lett. 90 042107 (2007)
W Y Yang, W G Kim and S W Rhee Thin Solid Films 517 967 (2008)
J Li, G Vizkelethy, P Revesz and J W Mayer J. Appl. Phys. 69 1020 (1991)
M Nolan and S D Elliott Thin Solid Films 516 1468 (2008)
P Samarasekara, N T R N Kumara and N U S Yapa J. Phys. Condens. Mater. 18 2417 (2006)
K Prasad, A K Jha, K Prasad and A R Kulkarni Indian J. Phys. 84 1355 (2010)
M C Santhosh Kumar and B Pradeep Indian J. Phys. 85 401 (2011)
T P Rao, M C Santhosh Kumar and V Ganesan Indian J. Phys. 85 1381 (2011)
M F Al-Kuhaili Vacuum 82 23 (2008)
T Mahalingam, J S P Chitra and P J Sebastian Mater. Lett. 58 1802 (2004)
L Arnelao, D Barreca, M Bertapelle, Y Batto, C Sada and E Tendelao Thin Solid Films 442 48 (2003)
M Yang and J J Zhu J. Cryst. Growth 256 134 (2003)
D R Markworlu, V Lau, J Y Dai, W Fan, J J Marks and R P H Chang J. Mater. Res. 16 2408 (2001)
K Amikura, T Kimuda, M Hamada, N Yokoyama, J Miyazaki and Y Yamada Appl. Surf. Sci. 254 6976 (2008).
A Chen, H Long, X Li, G Yang and P Lu Vacuum 83 927 (2009)
A R Rastkar, A R Niknam and B Shokri Thin Solid Films 517 5464 (2009)
H Zhu, J Zhang, C Li, F Pan, T Wang and B Huang Thin Solid Films 517 5700 (2009)
A Perretta, M K Jayaraj, A D Nocera, S Loreti, L Quercia and A Agati Phys. Solid State (a) 155 399 (1996)
S Ghosh, D K Avasthi, P Shah, V Ganesan, A Gupta, D Sarangi, R Bhattacharya and W Assmann Vacuum 57 377 (2000)
B Saha, R Thapa, N S Das and K K Chattopadhyay Indian J. Phys. 84, 681 (2010)
R Thapa, B Saha, S Goswami and K K Chattopadhyay Indian J. Phys. 84 1347 (2010)
J F Pierson, D Wiederkehr, J M Chappe and N Martin Appl. Surf. Sci. 253 1484 (2006)
J F Pierson, D Wiederkehr and A Billard Thin Solid Films 478 196 (2005)
A Sivasankar Reddy, G Venkata Rao, S Uthanna and P Sreedhara Reddy Mater. Lett. 60 1617 (2006)
A Sivasankar Reddy, S Uthanna and P Sreedhara Reddy Appl. Surf. Sci. 253 5287 (2007)
A Sivasankar Reddy, H H Park, V Sahadeva Reddy, K Venkatasubba Reddy, N S Sharma, S Kaleemulla, S Uthanna and P Sreedhara Reddy Mater. Chem. Phys. 110 397 (2008)
A Sivasankar Reddy, G Venkata Rao, S Uthanna, P Sreedhara Reddy and A Klein Phys. Solid State (a) 203 844 (2006)
A Sivasankar Reddy, G Venkata Rao, S Uthanna and P Sreedhara Reddy Physica B 370 29 (2005)
M I Maissel and R Glang (eds) Handbook of Thin Film Technology (New York: McGraw Hill) (1970)
X Mathew, N R Mathews and P J Sebastian Solar Energy Mater. Solar Cells 70 277 (2001)
T Mayurama Solar Energy Mater. Solar Cells 56 85 (1998)
M Hari Prasad Reddy PhD Thesis (Sri Venkateswara University, Tirupati, India) (2010).
B Balamurugan and B R Mehta Thin Solid Films 396 90 (2001)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Hari Prasad Reddy, M., Sreedhar, A. & Uthanna, S. Structural, surface morphological and optical properties of nanocrystalline Cu2O films prepared by RF magnetron sputtering: substrate bias effect. Indian J Phys 86, 291–295 (2012). https://doi.org/10.1007/s12648-012-0057-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s12648-012-0057-7