Abstract
Nanocrystalline ZnO thin films have been fabricated by an RF magnetron sputtering method for the different time duration. The effect of process parameters on the structural, morphological and Optical properties of ZnO were studied by X-ray diffraction (XRD), scanning electron microscopy (SEM), and Photoluminescence and UV-Vis. Spectrometer. All of the films were polycrystalline, and the preferred crystal plane orientation was (101) corresponding to 2𝜃 = 36.57∘, the crystallite sizes were increased from 12 nm to 18 nm as in XRD calculations and increase from 24nm to 33 nm as in SEM image. Optical constants, such as refractive index n, were determined from the transmittance spectrum in the ultraviolet -visible. The refractive index varies in the range of 1.664 to 8.706 with an increase in deposition time. Optical energy gap estimated from the transmittance (3.304 eV) and the PL (3.44 eV) shows good agreement and increased as the time duration was increased.
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Acknowledgments
This research was reinforced by the AL-Mustansiriyah University College of science, physics department and the work crew would like to acknowledge the ministry of science and technology for providing that support through the RF-magnetron sputtering system.
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Hassan, E.S., Abd, A.N. & Dawood, M.O. The Sputter Time Duration Effect on the Structural and Optical Properties of Zinc Oxide by RF Magnetron Sputtering. Silicon 10, 2901–2906 (2018). https://doi.org/10.1007/s12633-018-9831-2
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DOI: https://doi.org/10.1007/s12633-018-9831-2