High-Magnification SEM Micrograph of Siloxanes
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Scanning Electron Microscopy (SEM) is a powerful and efficient microscopy for the analysis of nanomaterials. Although this imaging technique is common and several standard methods exist for chemical analysis, questions remain about the optimal magnification and voltage to be used. The chemical molecules are relatively sensitive to the electron beam. HMDS is as often as possible utilized for surface treatment at the covering of the photosensitive material on the wafer, and trimethyl silanol is created, together with alkali, by hydrolysis of HMDS. This study specifically represents the best imaging condition to HMDS and reaction products of organosilicons. The greatest challenges of working with organosilicons molecules is imaging and characterizing features on such a small scale by SEM. The results support the conclusion that, contrary to what is usually recommended, it is best to determine the structure of organosilicons molecules without spectroscopy. It has been a convenient method for the emergence of the structure of HMDS and reaction products.
KeywordsSEM Imaging HMDS Siloxanes
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This work was conducted under the supervision of a Prof. M. Hannig at Clinic of Operative Dentistry, Periodontology and Preventive Dentistry, Saarland.
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