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Influence of \(\hbox {Si}_{3}\hbox {N}_{4}\) layer on the electrical properties of Au/n-4H SiC diodes

  • Fatih Yigiterol
  • Hasan H Gullu
  • Esra D Yildiz
Article

Abstract

In this study, the effect of \(\hbox {Si}_{3}\hbox {N}_{4}\) insulator layer on the electrical characteristics of Au/n-4H SiC diode was investigated. The current–voltage (\({I{-}V}\)), capacitance–voltage (\({C{-}V}\)) and conductance–voltage (\(G/w{-}V\)) measurements were carried out at room temperature condition. Under thermionic emission model, electrical parameters as zero-bias barrier height (\(\Phi _{\mathrm{Bo}}\)), ideality factor (n), interface states (\(D_{\mathrm{it}}\)), and series (\(R_{\mathrm{s}}\)) and shunt (\(R_{\mathrm{sh}}\)) resistances were estimated from forward bias \({I{-}V}\) analyses. The values of n and \(\Phi _{\mathrm{Bo}}\) were about 1.305 and 0.796 eV for metal–semiconductor (MS) rectifying diode, and 3.142 and 0.713 eV for metal–insulator–semiconductor (MIS) diode with the insertion of \(\hbox {Si}_{3}\hbox {N}_{4}\) layer, respectively. Since the values of n were greater than the unity, the fabricated diodes showed non-ideal \({I{-}V}\) behaviour. The energy distribution profile of \(D_{\mathrm{it}}\) of the diodes was calculated by taking into account of the bias dependence of the effective barrier height (\(\Phi _{\mathrm{e}}\)) and \(R_{\mathrm{s}}\). The obtained \(D_{\mathrm{it}}\) values with \(R_{\mathrm{s}}\) are almost one order of magnitude lower than those without \(R_{\mathrm{s}}\) for two diodes. According to Cheung’s model, \(R_{\mathrm{s}}\) were calculated and these values were found in increasing behaviour with the contribution of \(\hbox {Si}_{3}\hbox {N}_{4}\) insulator layer. In addition, the \(J_{\mathrm{R}}{-}V\) plot behaviours with linear dependence between ln(\(J_{\mathrm{R}}\)) vs. \(V^{0.5}\) indicated that the dominant conduction mechanism in the reverse bias region was Schottky effect for both MS and MIS diodes. In the room temperature \({C{-}V}\) measurements, different from the results of MIS diode, the values of C for MS diode was observed in decreasing behaviour from ideality with crossing the certain forward bias voltage point (\(\sim \) \(2.5\ \hbox {V}\)). The decrease in the negative capacitance corresponds to the increase of G / w.

Keywords

MS MIS insulator layer interface states \(\hbox {Si}_{3}\hbox {N}_{4}\) layer conduction mechanism 

Notes

Acknowledgements

This study was partially supported by The Management Unit of Scientific Research Project of Hitit University, under Project Numbers FEF19004.15.010 and FEF19002.15.001.

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Copyright information

© Indian Academy of Sciences 2018

Authors and Affiliations

  • Fatih Yigiterol
    • 1
  • Hasan H Gullu
    • 2
    • 3
    • 4
  • Esra D Yildiz
    • 1
  1. 1.Department of PhysicsHitit UniversityÇorumTurkey
  2. 2.Central LaboratoryMiddle East Technical UniversityAnkaraTurkey
  3. 3.Center for Solar Energy Research and Applications (GÜNAM)Middle East Technical UniversityAnkaraTurkey
  4. 4.Department of Electrical and Electronics EngineeringAtilim UniversityAnkaraTurkey

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