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Effect of Electron Beam Irradiation on Structural and Optical Properties of Cu-Doped In2O3 Films Prepared by RF Magnetron Sputtering

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Abstract

Undoped and Cu-doped In2O3 films were prepared by radiofrequency magnetron sputtering technique. The effects of Cu doping and high-energy electron beam irradiation on the structural and optical properties of as-prepared films were investigated using techniques such as x-ray diffraction, x-ray photoelectron spectroscopy (XPS), lateral scanning electron microscopic image analysis, energy-dispersive x-ray (EDX) spectroscopy, micro-Raman, and ultraviolet–visible (UV–vis) spectroscopy. Moderate doping of Cu in In2O3 enhanced the intensity of (222) peak, indicating alignment of crystalline grains along <111>. Electron beam irradiation promoted orientation of crystalline grains along <111> in undoped and moderately Cu-doped films. EDX spectroscopic and XPS analyses revealed incorporation of Cu2+ ions in the lattice. The transmittance of Cu-doped films decreased with e-beam irradiation. Systematic reduction of the bandgap energy with increase in Cu doping concentration was seen in unirradiated and electron-beam-irradiated films.

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Authors and Affiliations

  1. Department of Optoelectronics, University of Kerala, Kariavattom, Thiruvananthapuram, Kerala, 695581, India

    R. Reshmi Krishnan & V. P. Mahadevan Pillai

  2. Department of Physics, Mangalore University, Mangalagangotri, Karnataka, India

    Ganesh Sanjeev

  3. School of Engineering, Robert Gordon University, Aberdeen, UK

    Radhakrishna Prabhu

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  1. R. Reshmi Krishnan
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  4. V. P. Mahadevan Pillai
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Correspondence to V. P. Mahadevan Pillai.

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Krishnan, R.R., Sanjeev, G., Prabhu, R. et al. Effect of Electron Beam Irradiation on Structural and Optical Properties of Cu-Doped In2O3 Films Prepared by RF Magnetron Sputtering. JOM 70, 739–746 (2018). https://doi.org/10.1007/s11837-018-2776-5

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