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Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures

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Abstract

The aim of this study is to improve the electrical property of Ag/n-Si metal–semiconductor (MS) structure by growing an Ru-doped PVP interlayer between Ag and n-Si using electrospinning technique. To illustrate the utility of the Ru-doped PVP interface layer, current–voltage (I–V) characteristics of Ag/n-Si (MS) and Ag/Ru-doped PVP/n-Si metal–polymer–semiconductor (MPS) structures was carried out. In addition, the main electrical parameters of the fabricated Ag/Ru-doped PVP/n-Si structures were investigated as a function of frequency and electric field using impedance spectroscopy method (ISM). The capacitance–voltage (C–V) plot showed an anomalous peak in the depletion region due to the special density distribution of interface traps/states (Dit/Nss) and interlayer. Both the values of series resistance (Rs) and Nss were drawn as a function of voltage and frequency between 0.5 kHz and 5 MHz at room temperature and they had a peak behavior in the depletion region. Some important parameters of the sample such as the donor concentration atoms (ND), Fermi energy (E F ), thickness of the depletion region (WD), barrier height (Φ B0 ) and R s were determined from the C−2 versus V plot for each frequency. The values of N D , W D , Φ B0 and R s were changed from 1 × 1015 cm−3, 9.61 × 10−5 cm, 0.94 eV and 19,055 Ω (at 0.5 kHz) to 0.13 × 1015 cm−3, 27.4 × 10−4 cm, 1.04 eV and 70 Ω (at 5 MHz), respectively. As a result of the experiments, it is observed that the change in electrical parameters becomes more effective at lower frequencies due to the Nss and their relaxation time (τ), dipole and surface polarizations.

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Acknowledgements

This work was supported by ARTEMIZ Research and Development (R&D) Company. ARTEMIZ is an establishment financially supported by the Small and Medium Enterprises Development Organization (KOSGEB), Republic of Turkey.

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Authors and Affiliations

  1. Department of Advanced Technologies, Institute of Science and Technology, Gazi University, 06500, Ankara, Turkey

    Yosef Badali

  2. Department of Environmental Engineering, Institute of Science, Hacettepe University, 06800, Ankara, Turkey

    Afsoun Nikravan

  3. Department of Physics, Faculty of Science, Gazi University, 06500, Ankara, Turkey

    Şemsettin Altındal

  4. Department of Chemistry Education, Faculty of Education, Gazi University, Ankara, 06500, Turkey

    İbrahim Uslu

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  1. Yosef Badali
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  2. Afsoun Nikravan
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Correspondence to Yosef Badali.

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Badali, Y., Nikravan, A., Altındal, Ş. et al. Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures. J. Electron. Mater. 47, 3510–3520 (2018). https://doi.org/10.1007/s11664-018-6195-8

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  • DOI: https://doi.org/10.1007/s11664-018-6195-8

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