Application of a Tangential Magnetic Field and Negative Repetitively Pulsed Bias for Suppression of Vacuum-Arc Copper Macroparticles
- 25 Downloads
The joint effect of magnetic fields normal and tangential to the cathode surface and of short-pulse highfrequency bias potential of negative polarity on the accumulation of macroparticles on the potential target immersed in copper vacuum-arc plasma is studied. It is shown that the application of a vacuum-arc evaporator with the magnetic field tangential to the cathode surface reduces by 5 times generation of copper macroparticles in comparison with an axially symmetric vacuum-arc evaporator in which the magnetic field normal to the working cathode surface is used. It is established that the joint action of the tangential field and short-pulse high-frequency bias potential makes it possible to decrease by 2–3 orders of magnitude the density of copper macroparticles on the target surface.
Keywordsvacuum-arc discharge metal plasma microdrop fraction high-frequency short-pulse negative bias potential
Unable to display preview. Download preview PDF.
- 1.A. A. Plyutto, V. N. Ryzhkov, and A. T. Kapin, J. Exp. Theor. Phys., 20, 328 (1965).Google Scholar
- 2.V. M. Lunev, V. G. Padalka, and V. M. Khoroshikh, Instrum. Exp. Tech., 19, 465 (1976).Google Scholar
- 4.I. I. Aksenov, V. A. Belous, V. G. Padalka, and V. M. Khoroshikh, Prib. Tekh. Eksp., 21, 236 (1978).Google Scholar
- 11.D. Lafferti, Vacuum Arcs [Russian translation], V. I. Rakhovskii, ed., Mir, Moscow (1982).Google Scholar