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Application of a Tangential Magnetic Field and Negative Repetitively Pulsed Bias for Suppression of Vacuum-Arc Copper Macroparticles

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Russian Physics Journal Aims and scope

The joint effect of magnetic fields normal and tangential to the cathode surface and of short-pulse highfrequency bias potential of negative polarity on the accumulation of macroparticles on the potential target immersed in copper vacuum-arc plasma is studied. It is shown that the application of a vacuum-arc evaporator with the magnetic field tangential to the cathode surface reduces by 5 times generation of copper macroparticles in comparison with an axially symmetric vacuum-arc evaporator in which the magnetic field normal to the working cathode surface is used. It is established that the joint action of the tangential field and short-pulse high-frequency bias potential makes it possible to decrease by 2–3 orders of magnitude the density of copper macroparticles on the target surface.

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Authors and Affiliations

  1. National Reseach Tomsk Polytechnic University, Tomsk, Russia

    A. I. Ryabchikov, P. S. Anan’in & A. E. Shevelev

Authors
  1. A. I. Ryabchikov
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  2. P. S. Anan’in
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  3. A. E. Shevelev
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Correspondence to A. I. Ryabchikov.

Additional information

Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 6, pp. 125–130, June, 2016.

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Ryabchikov, A.I., Anan’in, P.S. & Shevelev, A.E. Application of a Tangential Magnetic Field and Negative Repetitively Pulsed Bias for Suppression of Vacuum-Arc Copper Macroparticles. Russ Phys J 59, 900–906 (2016). https://doi.org/10.1007/s11182-016-0851-3

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  • DOI: https://doi.org/10.1007/s11182-016-0851-3

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