Russian Physics Journal

, Volume 59, Issue 6, pp 900–906 | Cite as

Application of a Tangential Magnetic Field and Negative Repetitively Pulsed Bias for Suppression of Vacuum-Arc Copper Macroparticles

  • A. I. Ryabchikov
  • P. S. Anan’in
  • A. E. Shevelev

The joint effect of magnetic fields normal and tangential to the cathode surface and of short-pulse highfrequency bias potential of negative polarity on the accumulation of macroparticles on the potential target immersed in copper vacuum-arc plasma is studied. It is shown that the application of a vacuum-arc evaporator with the magnetic field tangential to the cathode surface reduces by 5 times generation of copper macroparticles in comparison with an axially symmetric vacuum-arc evaporator in which the magnetic field normal to the working cathode surface is used. It is established that the joint action of the tangential field and short-pulse high-frequency bias potential makes it possible to decrease by 2–3 orders of magnitude the density of copper macroparticles on the target surface.


vacuum-arc discharge metal plasma microdrop fraction high-frequency short-pulse negative bias potential 


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Copyright information

© Springer Science+Business Media New York 2016

Authors and Affiliations

  • A. I. Ryabchikov
    • 1
  • P. S. Anan’in
    • 1
  • A. E. Shevelev
    • 1
  1. 1.National Reseach Tomsk Polytechnic UniversityTomskRussia

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