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Russian Physics Journal

, Volume 58, Issue 11, pp 1569–1572 | Cite as

Formation of Organic Thin Films of Nonlinear Optical Materials by Molecular Layer Epitaxy

  • V. Burtman
  • T. N. Kopylova
  • M. Van Der Boom
  • R. M. Gadirov
  • E. N. Tel’minov
  • S. Yu. Nikonov
  • E. N. Nikonova
OPTICS AND SPECTROSCOPY
  • 40 Downloads

Conditions are described under which films of [(aminophenyl)azo]pyridine are formed by molecular layer epitaxy, and their optical absorption and x-ray photoelectron spectra are investigated. The nonlinear properties of such structures are described with the help of measurements of the intensity of second harmonic generation as a function of the angle of incidence.

Keywords

molecular layer epitaxy second harmonic generation 

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References

  1. 1.
    S. Yitzchaik and T. J. Marks, Acc. Chem. Res., 29, 197–202 (1996).CrossRefGoogle Scholar
  2. 2.
    W. Lin, W. Lin, G. K. Wong, and T. J. Marks, J. Am. Chem. Soc., 118, 8034– 8042 (1996).Google Scholar
  3. 3.
    S. Yitzchaik, S. B. Roscoe, et al., J. Phys. Chem., 97, 6958–6960 (1993).CrossRefGoogle Scholar
  4. 4.
    H. E. Katz, W. L. Wilson, and G. Scheller, J. Am. Chem. Soc., 116, 6636–6640 (1994).Google Scholar
  5. 5.
    F. Wang, A. W. Harper, et al., Chem. Mater., 11, No. 9, 2285 (1999).CrossRefGoogle Scholar
  6. 6.
    W. M. E. P. Wijekoon, S. K. Wijaya, et al., J. Am. Chem. Soc., 118, 4480–4483 (1996).CrossRefGoogle Scholar
  7. 7.
    W. Hung, M. Helvenston, et al., Langmuir, 15, 6510 (1999).CrossRefGoogle Scholar
  8. 8.
    L. Smilowitz, Q. X. Jia, et al., J. Appl. Phys., 81, No. 5, 2051–2054 (1997).ADSCrossRefGoogle Scholar
  9. 9.
    G. V. Mayer , T. N. Kopylova, Yu. M. Andreev, et al., Russ. Phys. J., 52, No. 6, 640–645 (2009).CrossRefGoogle Scholar
  10. 10.
    M. S. Johal, Y. W. Cao, et al., Chem. Mater., 11, 1962–1965 (1999).CrossRefGoogle Scholar
  11. 11.
    T. S. Koloski, C. S. Dulcey, Q. J. Haralson, and J. M. Calvert, Langmuir, 10, 3122–3133 (1994).CrossRefGoogle Scholar
  12. 12.
    E. I. Haskal, Y. Zhang, P. E. Burrows, and S. R. Forrest, Chem. Phys. Lett., 219, 325–330 (1994).ADSCrossRefGoogle Scholar
  13. 13.
    H. S. Imanishi, A. Kakuta, and S. Numata, Phys. Rev. Lett., 71, 2098–2101 (1993).ADSCrossRefGoogle Scholar
  14. 14.
    T. Tsuzuki, N. Hirota, N. Noma, and Y. Shirota, Thin Solid Films, 273, 177– 180 (1996).ADSCrossRefGoogle Scholar
  15. 15.
    T. Yoshimura, S. Tastuura, et al., Appl. Phys. Lett., 59, 482–484 (1991).ADSCrossRefGoogle Scholar
  16. 16.
    G. J. Ashwell, Molecular Electronics, John Wiley & Sons, New York (1992).Google Scholar
  17. 17.
    V. Burtman, A. Zelichenok, and A. Yitzchaik, Chem. Int. Ed., 38, 2041– 2045 (1999).CrossRefGoogle Scholar
  18. 18.
    R. Moaz and J. Sagiv, Langmuir, 3, 1034–1044 (1987).CrossRefGoogle Scholar
  19. 19.
    S. R. Wasserman, Y.-T. Tao, and G. M. Whitesides, Langmuir, 5, 1074–1087 (1989).CrossRefGoogle Scholar
  20. 20.
    R. Cohen, N. Zenou, D. Cahen, and S.Yitzchaik, Chem. Phys. Lett., 279, 270– 274 (1997).Google Scholar
  21. 21.
    J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-Ray Photoelectron Spectroscopy, Perkin Elmer Corp., Eden Prairie (1992).Google Scholar

Copyright information

© Springer Science+Business Media New York 2016

Authors and Affiliations

  • V. Burtman
    • 1
    • 2
  • T. N. Kopylova
    • 1
  • M. Van Der Boom
    • 3
  • R. M. Gadirov
    • 1
  • E. N. Tel’minov
    • 1
  • S. Yu. Nikonov
    • 1
  • E. N. Nikonova
    • 1
  1. 1.V. D. Kuznetsov Siberian Physical-Technical Institute at Tomsk State UniversityTomskRussia
  2. 2.Utah State UniversitySalt Lake CityUSA
  3. 3.Weizmann InstituteRehovotIsrael

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