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The effect of low-temperature annealing on the electrical properties of the p-type cadmium–mercury–tellurium heterostructures grown by molecular beam epitaxy

  • Physics of Semiconductors and Dielectrics
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Russian Physics Journal Aims and scope

Annealing of the p-type CMT samples at temperatures 90–120°C results in a sharp increase (by two to three orders of magnitude) in the concentration of holes. In the case where the sample surfaces were not protected with a photoresist before annealing, they contacted with aqueous solutions. During annealing, these samples were fixed with indium having an ohmic contact with CMT. The presence of indium on the sample surfaces led to the gradient of Hg and Cd elements in the near-surface region under annealing. No chemical elements acting usually as acceptors in CMT were observed in these samples by Auger spectroscopy. Hydrogen is likely to be an acceptor causing an increase of hole concentration.

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Correspondence to D. Yu. Protasov.

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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 3, pp. 69–74, March, 2013.

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Protasov, D.Y., Novoselov, А.R., Kombarov, D.V. et al. The effect of low-temperature annealing on the electrical properties of the p-type cadmium–mercury–tellurium heterostructures grown by molecular beam epitaxy. Russ Phys J 56, 313–318 (2013). https://doi.org/10.1007/s11182-013-0033-5

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  • DOI: https://doi.org/10.1007/s11182-013-0033-5

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