Voluminous high-density plasma generator based on high-current pulsed magnetron discharge
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Results of investigations into the spatial and temporal parameters of the voluminous plasma generated by two high-current pulsed magnetron sputtering systems operating in balanced and unbalanced regimes are presented. It is demonstrated that the plasma filling the vacuum chamber comprises two components: the plasma drifting from the region of magnetron magnetic traps and the plasma generated by oscillating electrons directly in the chamber volume. For the balanced magnetron magnetic field configuration, the plasma in the centre of the vacuum chamber with volume of ~10 L has concentration of (1–2)⋅1013 cm−3 for magnetron discharge current amplitude of 350 A. The application of the unbalanced magnetic field configuration allows the plasma concentration in the central part of the vacuum chamber to be increased to ~6⋅1013 cm−3.
Keywordsmagnetron sputtering system magnetron discharge treatment by plasma immersion
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