A condition of applicability of the Boltzmann equation for calculating the relaxation time of holes in isotropic polycrystalline p-type silicon is formulated for hole scattering both by a disordered system of potential barriers on the surfaces of crystallites and a disordered lattice of silicon atoms characterized by a local order. An assessment of the range of applicability of the Boltzmann equation for calculating the relaxation time of holes in isotropic polycrystalline p-silicon is made for a given scattering mechanism in the temperature T = 200–600 K and hole concentration p = (5.0 - 10.0)·1019 cm-3 ranges. The mean distance Lφ covered by a charge carrier, when it loses the phase due to inelastic phonon scattering, is estimated for an isotropic polycrystalline p-silicon.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 10, pp. 69–78, October, 2010.
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Moiseev, A.G. Evaluation of the applicability range of the kinetic Boltzmann equation for calculating the carrier relaxation time in isotropic polycrystalline p-silicon. Russ Phys J 53, 1060–1071 (2011). https://doi.org/10.1007/s11182-011-9531-5
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DOI: https://doi.org/10.1007/s11182-011-9531-5