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Russian Physics Journal

, Volume 50, Issue 11, pp 1154–1157 | Cite as

Analysis of the relief of the GaAs surface formed upon exposure to diffraction-modulated laser radiation

  • D. S. Moskal
  • V. A. Nadtochy
  • N. N. Golodenko
Article
  • 27 Downloads

Abstract

A relief of the GaAs surface irradiated by a laser through diffraction masks having different profiles is investigated. The incident beam energy density does not exceed the threshold value. Clusters of point defects are formed in the crystal surface layer upon exposure to diffraction-modulated laser radiation. With the help of theoretical calculations, it is established that clusterization in the surface layer results from redistribution of point defects in the periodic field of thermoelastic stresses.

Keywords

GaAs Atomic Force Microscopy Image Surface Relief Gallium Arsenide GaAs Surface 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media, Inc. 2007

Authors and Affiliations

  • D. S. Moskal
    • 1
  • V. A. Nadtochy
    • 1
  • N. N. Golodenko
    • 1
  1. 1.Slavic State Pedagogical UniversityUkraine

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