Reaction Kinetics and Catalysis Letters

, Volume 97, Issue 2, pp 321–327 | Cite as

Interaction of Co nanoparticles with SiO2: silicide formation

  • Danuta Potoczna-Petru
  • Leszek Kępiński
  • Ludwina Krajczyk


The interaction of 1 and 4 nm thick Co films with SiO2 support in vacuum at high temperature has been investigated by TEM, SAED and HRTEM methods. It was found that annealing in vacuum at 800 °C caused the transformation of the smallest Co particles into Co2Si silicide.


Co films SiO2 Metal-support interaction Silicide formation 



The authors wish to thank Mrs. A. Cielecka and Z. Mazurkiewicz for skillful technical assistance.


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Copyright information

© Akadémiai Kiadó, Budapest, Hungary 2009

Authors and Affiliations

  • Danuta Potoczna-Petru
    • 1
  • Leszek Kępiński
    • 1
  • Ludwina Krajczyk
    • 1
  1. 1.Institute of Low Temperature and Structure Research, Polish Academy of SciencesWrocławPoland

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