Abstract
In this study, a TiO2 film was prepared in an annular reactor by the chemical vapor deposition (CVD) method. Results indicated that anatase crystals were formed, except for at a deposition temperature of 200°C without calcination. At a calcination temperature of 850°C, anatase crystal was the major species formed with a small amount of rutile crystals. After conducting a photocatalytic reaction of toluene, the best activity was found with a preparation temperature of 350°C for the deposition, and 550°C for calcination.
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Wang, KH., Hsieh, YH., Lin, TT. et al. Effects of temperature on the properties of TiO2 photocatalysts prepared by the chemical vapor deposition (CVD) method. React Kinet Catal Lett 95, 39–46 (2008). https://doi.org/10.1007/s11144-008-5317-3
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DOI: https://doi.org/10.1007/s11144-008-5317-3