Effects of temperature on the properties of TiO2 photocatalysts prepared by the chemical vapor deposition (CVD) method

  • Kuo-Hua Wang
  • Yung-Hsu Hsieh
  • Tsai-Tu Lin
  • Chen-Yu Chang


In this study, a TiO2 film was prepared in an annular reactor by the chemical vapor deposition (CVD) method. Results indicated that anatase crystals were formed, except for at a deposition temperature of 200°C without calcination. At a calcination temperature of 850°C, anatase crystal was the major species formed with a small amount of rutile crystals. After conducting a photocatalytic reaction of toluene, the best activity was found with a preparation temperature of 350°C for the deposition, and 550°C for calcination.


Titanium dioxide chemical vapor deposition photocatalysis 


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Copyright information

© Springer Science+Business Media, LLC. 2008

Authors and Affiliations

  • Kuo-Hua Wang
    • 1
  • Yung-Hsu Hsieh
    • 2
  • Tsai-Tu Lin
    • 2
  • Chen-Yu Chang
    • 3
  1. 1.Institute of Labor ScienceChinese Culture UniversityYang Ming Shan TaipeiTaiwan
  2. 2.Department of Environmental EngineeringNational Chung Hsing UniversityTaichungTaiwan
  3. 3.Department of Life ScienceMing Dao UniversityPeetow, ChanghuaTaiwan

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