Powder Metallurgy and Metal Ceramics

, Volume 44, Issue 9–10, pp 499–504 | Cite as

Effects of Deposition Conditions on Carbon-Film Resistivity and Microstructure

  • A. A. Onoprienko
  • I. B. Yanchuk
Structural Studies of Materials


Studies have been made on the dependence of carbon-film resistivity on deposition temperature (20–650 °C) and magnetron discharge power (50–650 W). Electron diffraction and Raman scattering have been used to examine the film structure. The results suggest that the structure is formed mainly by carbon atoms with sp2 bonding. In the range 20–450 °C, aromatic rings are formed together with graphitic clusters, and the degree of ordering increases with the condensation temperature. At T ≥ 500 °C, there is a change in the mechanism of C film growth, and graphitic-phase nuclei are formed and grow directly on the substrate. At a sufficiently high magnetron discharge power, there is uncontrolled heating of the condensation surface in the deposition of carbon films on ceramic substrates with low thermal conductivity. The growing film is affected by two competing processes: the temperature rise in the substrate favors graphitization, while the increase in the energy of the particles forming the film causes disordering. In the power range 50–400 W, the substrate temperature effect predominates, but above 400 W, the particle energy effect does.


amorphous carbon film magnetron sputtering resistivity structure Raman scattering 


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  1. 1.
    S. Anders, J. W. Ager III, G. M. Pharr, et al., “Heat treatment of cathodic arc deposited amorphous hard carbon films,” Thin Solid Films, 308–309, 186–190 (1997).Google Scholar
  2. 2.
    M. Chhowalla, A. C. Ferrary, J. Robertson, and G. A. J. Amaratunga, “Evolution of sp 2 bonding with deposition temperature in tetrahedral amorphous carbon studied by Raman spectroscopy,” Appl. Phys. Lett., 76, 1419–1421 (2000).CrossRefGoogle Scholar
  3. 3.
    M. A. Capano, N. T. McDevitt, R. K. Singh, and F. Qian, “Characterization of amorphous carbon thin films,” J. Vac. Sci. Technol., A14, No.2, 431–435 (1996).Google Scholar
  4. 4.
    I. Alexandrou, H.-J. Scheibe, C. J. Kiely, et al., “Carbon films with an sp 2 network structure,” Phys. Rev. B, 60, No.15, 10903–10907 (1999).CrossRefGoogle Scholar
  5. 5.
    Y. Lifshitz, G. D. Lempert, S. Rotter, et al., “The influence of substrate temperature during ion beam deposition on the diamond-like or graphitic nature of carbon films,” Diamond Relat. Mater., 2, No.2–4, 285–290 (1993).Google Scholar
  6. 6.
    H. Hofsass, H. Binder, T. Klumpp, and E. Recknagel, “Doping and growth of diamond-like carbon films by ion beam deposition,” Diamond Relat. Mater., 3, No.1–2, 137–142 (1994).Google Scholar
  7. 7.
    J. J. Cuomo, D. L. Pappas, J. Bruley, et al., “Vapor deposition processes for amorphous carbon films with sp 3 fractions approaching diamond,” J. Appl. Phys., 70, No.3, 1706–1711 (1991).CrossRefGoogle Scholar
  8. 8.
    E. Mounier, F. Bertin, M. Adamik, et al., “Effect of substrate temperature on the physical characteristics of amorphous carbon films deposited by dc magnetron sputtering,” Diamond Relat. Mater., 5, No.12, 1509–1515 (1996).Google Scholar
  9. 9.
    J. Fetter, M. Stuber, and S. Ulrich, “Growth effects in carbon coatings deposited by magnetron sputtering,” Surf. Coat. Technol., 168, 169–178 (2003).Google Scholar
  10. 10.
    L. R. Shaginyan, A. A. Onoprienko, V. F. Britun, and V. P. Smirnov, “Influence of different physical factors on microstructure and properties of magnetron sputtered amorphous carbon films,” Thin Solid Films, 397, 288–295 (2001).CrossRefGoogle Scholar
  11. 11.
    Y. Lifshitz, G. D. Lempert, S. Rotter, et al., “The effect of ion energy on the diamond-like/graphitic (sp 3/sp 2) nature of carbon films deposited by ion beams,” Diamond Relat. Mater., 3, 542–546 (1994).Google Scholar
  12. 12.
    Y. Lifshitz, “Diamond-like carbon-present status,” Diamond Relat. Mater., 8, 1659–1676 (1999).Google Scholar
  13. 13.
    A. C. Ferrary and J. Robertson, “Interpretation of Raman spectra of disordered and amorphous carbon,” Phys. Rev. B, 61, No.20, 14095–14107 (2000).Google Scholar
  14. 14.
    S. Bhargava, H. D. Bist, S. B. Samanta, et al., “Nanoclusters in laser ablated diamond-like carbon films through scanning tunneling microscopy,” J. Appl. Phys., 90, No.3, 205–209 (1996).Google Scholar
  15. 15.
    T. A. Friedman, K. F. McCarty, J. C. Barbour, et al., “Thermal stability of amorphous carbon films grown by pulsed laser deposition,” Appl. Phys. Lett., 68, No.12, 1643–1645 (1996).Google Scholar
  16. 16.
    A. A. Onoprienko, V. V. Artamonov, and I. B. Yanchuk, “Effect of deposition and anneal temperature on the resistivity of magnetron sputtered carbon films,” Surf. Coat. Tech., 172, 189–193 (2003).Google Scholar
  17. 17.
    A. Zeng, E. Liu, S. Zhang, et al., “Impedance study on electrochemical characteristics of sputtered DLC films,” Thin Solid Films, 426, 258–264 (2003).CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media, Inc. 2005

Authors and Affiliations

  • A. A. Onoprienko
    • 1
    • 2
  • I. B. Yanchuk
    • 1
    • 2
  1. 1.Institute for Problems of Materials ScienceNational Academy of Sciences of UkraineKievUkraine
  2. 2.Semiconductor Physics InstituteNational Academy of Sciences of UkraineKievUkraine

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