Influence of N2/O2 Mixtures on Decomposition of Naphthalene in Surface Dielectric Barrier Discharge Based Reactor
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The decomposition of naphthalene in surface dielectric barrier discharge (SDBD) based reactor is investigated in different carrier gases (air, nitrogen, and oxygen) in order to understand the reaction mechanism of the decomposition process. The decomposition efficiency of naphthalene is determined at different oxygen content (from 0 to 10 vol%) and different input power. The highest decomposition efficiency is obtained in nitrogen at low input power, due to the role played by the nitrogen excited species in the decomposition process. In addition, the decomposition efficiency is decreased with increasing the oxygen content at a low input power. At a relatively high input power, the decomposition efficiency reached its maximum value in pure oxygen. Moreover, the decomposition efficiency decreases with the increase of the oxygen content reaching minimum value at a small content of oxygen (~3 vol% O2) and relatively high input power, and then increases at higher oxygen content. The results show that the decomposition of naphthalene in the present reactor could be treated as a first order reaction with respect to the concentration of naphthalene.
KeywordsSurface discharge Decomposition efficiency Naphthalene Oxygen content
The authors would like to present deep thanks to Dr. T. Ishijima, Associate professor at Research Center for Sustainable Energy and Technology—Kanazawa University, for his help and suggestions in the optical spectroscopic measurements. Moreover, the authors express sincere appreciation to Walid M. Hikal, Postdoc in Texas Tech., for his valuable comments in this work.
- 1.Harvey RG (1997) Polycyclic aromatic hydrocarbons. Wiley-VCH, New YorkGoogle Scholar
- 10.Dann T (1989) Polycyclic aromatic hydrocarbons in the ambient air of Toronto, Ontario and Montréal, Québec. Pollution Measurement Division, Technology Development and Technology Services Branch, Environment CanadaGoogle Scholar
- 19.Mok YS, Lee S, Chang MS (2009) Destruction of chlorodifluoromethane (CHF2Cl) by using dielectric barrier discharge plasma. IEEE Trans Ind Appl 37:449–455Google Scholar
- 21.Lu B, Ji M, Wang MY, Lv J (2009) Ethanethiol removal using a novel plasma reactor combined with Mn/g–Al2O3. In: International conference on environmental science and information application technology, Wuhan, pp 623–626Google Scholar
- 37.Kogelschatz U, Eliasson B, Egli W (1997) Dielectric-barrier discharges: principle and applications. Le J Phys IV 07:C4-47-C44-66Google Scholar