Plasma Chemistry and Plasma Processing

, Volume 34, Issue 6, pp 1433–1446 | Cite as

Growth of ZnO Thin Films by Spray Plasma Technique: Correlation Between Spectroscopic Measurements and Film Properties

Original Paper


Nanostructured ZnO thin films have been deposited on glass substrate at low substrate temperature (200 °C) using the Spray Plasma technique. The zinc nitrate or zinc chloride precursors (droplets) are injected in a low-pressure Ar/O2 radio-frequency inductive discharge. The O2 fraction and the distance between the inductive coil and the substrate holder were varied, and the resulting effect on the deposited film properties was investigated by means of X-ray diffraction, atomic force microscopy, transmittance electron microscopy and UV–visible spectroscopy. It was shown that the c-axis orientation growth depends on these two parameters but not on the precursor nature. The quality of the deposited film is optimal for 5 % O2 in argon when the inductive coil-substrate distance is small. The Ar/O2 plasma was also diagnosed by optical emission spectroscopy. The oxygen atom relative concentration was monitored by optical emission actinometry and the rotational spectrum of OH was recorded to estimate the gas temperature.


Zinc oxide Spray Plasma deposition Inductively coupled argon–oxygen plasma Optical emission spectroscopy X-ray diffraction 



This work was partially supported by the CNRS interdisciplinary energy program. Authors would like to thank Dr. Ovidiu Brinza for the help in Transmittance Electron Microscopy.


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Copyright information

© Springer Science+Business Media New York 2014

Authors and Affiliations

  • Kamal Baba
    • 1
  • Claudia Lazzaroni
    • 1
  • Mehrdad Nikravech
    • 1
  1. 1.LSPM-CNRS, Laboratoire des Sciences des Procédés et des Matériaux (UPR 3407)Université Paris 13, Sorbonne Paris CitéVilletaneuseFrance

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