Abstract
The removal of 500 ppm acetaldehyde in nitrogen at 1 bar is characterized in a pulse dielectric barrier discharge generating a spatial random distribution of plasma filaments. The identification and the quantification of numerous by-products are performed. At 20 °C, CH3CHO is efficiently dissociated, probably owing to quenching of N2 metastable states. The most abundant by-products are CO, H2, and CH4, in consistency with the three important exit channels for the quenching of the N2(A3Σ +u ) state by CH3CHO proposed by Faider et al. (2011). In order of importance, other products are HCN, C2H6, CH3CN, HNCO, CO2, CH3COCH3, C2H4, C2H5CN, NH3, C2H2, and a group of nitriles and of ketones. An increase of the temperature from 20 °C up to 300 °C induces a strong decrease of the removal characteristic energy, but the by-products types remain unchanged. Probably the reaction of H with CH3CHO plays a role in the removal of the molecule at 300 °C.
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Vercammen K, Berezin A (1997) J Adv Oxid Technol 2:312
Rosocha L, Korzekwa R (1999) J Adv Oxid Technol 4:247
Hackam R, Akiyama H (2000) IEEE Trans Dielect Elect Ins 7:654
Yan K, van Heesch E, Pemen A, Huijbrechts P (2001) Plasma Chem Plasma Proc 21:107
Mok Y, Nam C, Cho M, Nam I-S (2002) IEEE Trans Plasma Sci 30:408
Pasquiers S (2004) Eur Phys J Appl Phys 28:319
Kim H-H (2004) Plasma Process Polym 1:91
Van Durme J, Dewulf J, Leys C, Van Langenhove H (2008) Appl Catal B Environ 78:324
Chen H, Lee H, Chen S, Chang M, Yu S, Li S (2009) Environ Sci Technol 43:2216
Kim H-H, Ogata A (2011) Eur Phys J Appl Phys 55:13806
Destaillats H, Maddalena R, Singer B, Hodgson A, McKone T (2008) Atmos Environ 42:1371
Graham L, Belisle S, Baas C-L (2008) Atmos Environ 42:4498
Zlotopol’skii V, Smolenskaya T (1996) High Energy Chem 30:188
Kinoshita K, Fujiyama Y, Kim H, Katsura S, Mizuno A (1997) J Electrostat 42:83
Lee H, Chang M (2001) Plasma Chem Plasma Proc 21:329
Koeta O, Blin-Simiand N, Pasquiers S, Bary A, Jorand F, Postel C (2010) 12th international symposium high pressure low temp plasma chemistry, Trenčianske Teplice (Slovakia), Book of contributed papers (Országh J, Papp P, Matejčík Š (eds) Comenius University, Bratislava, Slovakia), p 402
Faungnawakij K, Sano N, Yamamoto D, Kanki T, Charinpanitkul T, Tanthapanichakoon W (2004) Chem Eng J 103:115
Klett C, Touchard S, Vega A, Redolfi M, Duten X, Hassouni K (2011) Acta Tech 56:T43
Magne L, Pasquiers S, Edon V, Jorand F, Postel C, Amorim J (2005) J Phys D Appl Phys 38:3446
Faider W, Pasquiers S, Blin-Simiand N, Jeanney P, Jorand F, Magne L (2011) 20th international symposium on plasma chemistry, Philadelphia, USA. Contributed papers (A.J. Drexel Plasma Institute, http://ispc20.plasmainstitute.org/) no196
Blin-Simiand N, Jorand F, Magne L, Pasquiers S, Postel C, Vacher J-R (2008) Plasma Chem Plasma Proc 28:429
Blin-Simiand N, Pasquiers S, Jorand F, Postel C, Vacher J-R (2009) J Phys D Appl Phys 42:122003
Molspec: Synthetic molecular spectra generator based on the HITRAN database. Laser Components GmbH, Olching, Germany. http://www.lasercomponents.com
Roberts J, Veres P, Warneke C, Neuman J, Washenfelder R, Brown S, Baasandorj M, Burkholder J, Burling I, Johnson T, Yokelson R, de Gouw J (2010) Atmos Meas Tech Discuss 3:301
Penetrante B, Hsiao M, Bardsley J, Merritt B, Vogtlin G, Wallman P (1996) Pure Appl Chem 68:1083
Hsiao M, Penetrante B, Merritt B, Vogtlin G, Wallman P (1997) J Adv Oxid Technol 2:306
Chang M, Chang C-C (1997) Am Inst Chem Eng (AIChE) J 43:1325
Song Y, Cha M, Kim Y, Kim K, Kim S, Han S, Choi K (2003) J Adv Oxid Technol 6:11
Demidyuk V, Whitehead J (2007) Plasma Chem Plasma Proc 27:85
Blin-Simiand N, Jorand F, Magne L, Pasquiers S, Postel C (2008) 11th international symposium on high pressure low temp plasma chemistry, Oleron Island (France), contributed papers vol 2 (Gherardi N (ed) Université Paul Sabatier, Toulouse, France) p 332
Jarrige J, Blin-Simiand N, Jorand F, Magne L, Pasquiers S, Postel C (2005) 17th international symposium on plasma chemistry, Toronto Canada), contributed papers (Mostaghimi J, Coyle T, Pershin V, Salimi Jazi H (eds) University of Toronto, Toronto, Canada) p 248
Falkenstein Z (1999) J Appl Phys 85:525
Ogata A, Ito D, Mizuno K, Kushiyama S, Gal A, Yamamoto T (2002) Appl Catal A 236:9
Frisch M et al (2004) Gaussian 03, Revision C.02. Gaussian Inc., Wallingford
C. Klett (2011) PhD thesis, Université Paris 13, France
Herron J (1999) J Phys Chem Ref Data 28:1453
Magne L, Pasquiers S, Gadonna K, Jeanney P, Blin-Simiand N, Jorand F, Postel C (2009) J Phys D Appl Phys 42:165203
Fresnet F, Baravian G, Magne L, Pasquiers S, Postel C, Puech V, Rousseau A (2000) Appl Phys Lett 77:4118
Navaroo-González R, Ramirez S-I (1997) Adv Space Res 19:1121
Moreau N, Pasquiers S, Blin-Simiand N, Magne L, Jorand F, Postel C, Vacher J-R (2010) J Phys D Appl Phys 43:285201
Piper L (1987) J Chem Phys 87:1625
Balla R-J, Casleton K-H, Adams J-S, Pasternack L (1991) J Phys Chem 95:8694
Sims I-R, Queffelec J-L, Travers D, Rowe B-R, Herbert L-B, Karthäuser J, Smith I-WM (1993) Chem Phys Lett 211:461
Gautier T, Carrasco N, Buch A, Szopa C, Sciamma-O’Brien E, Cernogora G (2011) Icarus 213:625
Butterfield M-T, Yu T, Lin M-C (1993) Chem Phys 169:129
Gannon K-L, Glowacki D-R, Blitz M-A, Hughes K-J, Pilling M-J, Seakins P-W (2007) J Phys Chem A 111:6679
Trevitt A-J, Goulay F, Meloni G, Osborn D-L, Taatjes C-A, Leone S-R (2009) Int J Mass Spectrom 280:113
Trevitt A-J, Soorkia S, Savee J-D, Selby T-S, Osborn D-L, Taatjes C-A, Leone S-R (2011) J Phys Chem A 115:13467
Balucani N, Asvany O, Osamura Y, Huang L-C-L, Lee Y-T, Kaiser R-I (2000) Planet Space Sci 48:447
Balucani N (2009) Int J Mol Sci 10:2304
Balucani N, Cartechini L, Alagia M, Casavecchia P, Volpi G-G (2000) J Phys Chem A 104:5655
Kakkar R, Walia V (1992) Int J Quantum Chem 44:363
Magne L, Blin-Simiand N, Gadonna K, Jeanney P, Jorand F, Pasquiers S, Postel C (2009) Eur Phys J Appl Phys 47:22816
Mallard W, Westley F, Herron J, Hampson R, Frizzell D (1998) NIST Chemical kinetics database (version 2Q98)
Baulch D, Cox R, Hampson R, Kerr J, Troe J, Watson R (1984) J Phys Chem Ref Data 13:1259
Tsang W, Hampson R (1986) J Phys Chem Ref Data 15:1087
Tsang W, Herron J (1991) J Phys Chem Ref Data 20:609
Baulch D, Cobos C, Cox R, Esser C, Frank P, Just Th, Kerr J, Pilling M, Troe J, Walker R, Warnatz J (1992) J Phys Chem Ref Data 21:411
Tsang W (1991) J Phys Chem Ref Data 21:753
Baulch D, Cobos C, Cox R, Frank P, Hayman G, Just Th, Kerr J, Murrells T, Pilling M, Troe J, Walker R, Warnatz J (1995) J Phys Chem Ref Data 24:1609 Erratum: same authors (1994) J Phys Chem Ref Data 23:847
Westley F (1980) N.B.S. Standard Ref Data, US vol 67
Tsai C, McFadden D (1990) J Phys Chem 94:3298
Nesbitt F, Marston G, Stief L (1990) J Phys Chem 94:4946
Dautov N, Starik A-M (1997) Kinet Catalyst 38:185
Legrand J-C, Diamy A-M, Hrach R, Hrackova V (1997) Contrib Plasma Phys 37:521
Acknowledgments
O. Koeta thanks the FONER (Fond National pour l’Education et la Recherche), Burkina Faso, for financial support.
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Appendix
Appendix
Following reactions are important for the ethynyl radical,
Then reactions of the methylidyne radical, coming from (82), and reactions of the ethyl radical, coming from (85), occur,
Note that reaction (86) produces the methylene radical, and reaction (89) the vinyl radical.
Important lost reactions of the vinyl radical are the followings,
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Koeta, O., Blin-Simiand, N., Faider, W. et al. Decomposition of Acetaldehyde in Atmospheric Pressure Filamentary Nitrogen Plasma. Plasma Chem Plasma Process 32, 991–1023 (2012). https://doi.org/10.1007/s11090-012-9388-6
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DOI: https://doi.org/10.1007/s11090-012-9388-6