Oxidation of Metals

, Volume 81, Issue 1–2, pp 253–265 | Cite as

Preparation of Self-Healing α-Al2O3 Films by Low Temperature Thermal Oxidation

  • Jun Cai
  • Yan Li
  • Jin-ming Wu
  • Guo-ping Ling
Original Paper


This paper reports a new approach to lowering the temperature necessary for the preparation of α-Al2O3. Oxidation of Al–Cr alloys, with Cr contents of 18, 23 and 27 %, was performed at temperatures ranging from 620 to 720 °C in air for 100 h. The resulting oxide films were analyzed by SEM, EDS, XRD and XPS. The results showed that α-Al2O3 films were obtained following oxidation of the 18 and 23 wt% Cr alloy samples at 720 °C and that rough surfaces were conducive to the formation of α-Al2O3 such that peened surface samples showed significant α-Al2O3 growth while polished samples showed no oxide by XRD. A 23 wt% Cr sample with a roughened surface exhibited the formation of α-Al2O3 at a temperature of 670 °C. Conversely, only a very thin oxide film was observed on a 27 wt% Cr sample after oxidation at 720 °C.


α-Al2O3 Al–Cr alloy Thermal oxidization Low temperature 



This research was supported by the Open Foundation of Key Laboratory for Science and Technology on Surface Physics and Chemistry, China (Grant No. SPC201101).


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Copyright information

© Springer Science+Business Media New York 2013

Authors and Affiliations

  1. 1.Department of Materials Science and EngineeringZhejiang UniversityHangzhouChina

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