Optical and Quantum Electronics

, Volume 47, Issue 6, pp 1503–1508 | Cite as

Design of ZnS antireflective microstructures for mid- and far-infrared applications

  • Y. J. Yoo
  • K. S. Chang
  • S. W. Hong
  • Y. M. Song


We present broadband antireflective microstructures (AMSs) for high-performance imaging systems in mid- and far-infrared wavelength ranges. Diffraction efficiencies of AMSs on ZnS substrates were calculated using a rigorous coupled wave analysis method. The results show the effect of height, period, and shape of AMSs on the reflection characteristics. We also discuss the optimum geometry of AMSs by considering fabrication tolerances.


Subwavelength grating Antireflection Microstructure Zinc sulfide 



Y. J. Yoo and K. S. Chang contributed to this work equally. This work was partly supported by the Korea Basic Science Institute grant (D34500), by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT & Future Planning (2014R1A1A1005945), and by BK21PLUS, Creative Human Resource Development Program for IT Convergence.


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Copyright information

© Springer Science+Business Media New York 2015

Authors and Affiliations

  1. 1.Department of Electronics EngineeringPusan National UniversityBusanRepublic of Korea
  2. 2.Center for Analytical Instrumentation DevelopmentKorea Basic Science InstituteDaejeonRepublic of Korea
  3. 3.Department of Cogno-Mechatronics EngineeringPusan National UniversityBusanRepublic of Korea

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